Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|'''Ma-N 2403''' | |'''Ma-N 2403''' | ||
|'''Mr EBL 6000''' | |'''Mr EBL 6000''' | ||
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|Negative | |Negative | ||
|Negative | |Negative | ||
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|Micro Resist | |Micro Resist | ||
|Micro Resist | |Micro Resist | ||
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|Standard negative resist | |Standard negative resist | ||
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|[[media:AR_P617.pdf|AR_P617.pdf]] | |[[media:AR_P617.pdf|AR_P617.pdf]] | ||
|[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]] | |[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]] | ||
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|'''Spinner''' | |'''Spinner''' | ||
|SSE, Manual Spinner 1, III-V Spinner | |SSE, Manual Spinner 1, III-V Spinner | ||
|Manual Spinner 1, III-V spinner | |Manual Spinner 1, III-V spinner | ||
|Manual Spinner 1, III-V spinner | |Manual Spinner 1, III-V spinner | ||
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|Ma-D333/TMAH, MIF726 | |Ma-D333/TMAH, MIF726 | ||
|mr. Dev | |mr. Dev | ||
|- | |- | ||
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|H2O | |H2O | ||
|H2O | |H2O | ||
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|acetone/O2 plasma | |acetone/O2 plasma | ||
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|Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | |Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | ||
|[[media:Process_Flow_CSAR.docx|Process_Flow_CSAR.docx]] | |[[media:Process_Flow_CSAR.docx|Process_Flow_CSAR.docx]] | ||
|BB | |BB | ||
|BB | |BB | ||
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|Negative | |Negative | ||
|Micro Resist | |Micro Resist | ||
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| | | | ||
|III-V Spinner | |III-V Spinner | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|'''Mr EBL 6000''' | |'''Mr EBL 6000''' | ||
|Negative | |||
|Micro Resist | |Micro Resist | ||
|Not tested yet | |Not tested yet | ||
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|} | |} | ||