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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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Line 209: Line 209:
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
|'''Rinse'''
|'''Rinse'''
|AA
|IPA
|AA
|IPA
|AA
|IPA
|AA
|
|AA
|H2O
|BB
|H2O
|BB
|H2O
|BB
|
|BB
|


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''Remover'''
|'''Remover'''
|AA
|acetone/1165
|AA
|acetone/1165
|AA
|acetone/1165/Pirahna
|AA
|acetone/1165
|AA
|
|BB
|
|BB
|acetone/O2 plasma
|BB
|
|BB
|


|-
|-
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