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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''Developer'''
|'''Developer'''
|AA
|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene
|AA
|ZED-N500/Hexyl Acetate,n-amyl acetate, oxylene
|AA
|MIBK:IPA (1:3)/IPA:H2O
|AA
|AR600-55/MIBK:IPA
|AA
|X AR 600-54-6/MIBK:IPA
|BB
|TMAH/AZ400K:H2O
|BB
|Ma-D333/TMAH, MIF726
|BB
|mr. Dev
|BB
|XX


|-
|-
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