Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|'''Process Flow (docx-format)''' | |'''Process Flow (docx-format)''' | ||
|[[media:Process_Flow_ZEP.docx|Process_Flow_ZEP.docx]] | |[[media:Process_Flow_ZEP.docx|Process_Flow_ZEP.docx]] | ||
|Trilayer stack: [[Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | |Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | ||
|AA | |AA | ||
|Trilayer stack: [[Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | |Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | ||
|AA | |AA | ||
|BB | |BB | ||