Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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* ZEP520A (standard resist), FLOW | * ZEP520A (standard resist), FLOW | ||
* table of available resists | * table of available resists | ||
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="80%" | |||
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|-style="background:silver; color:black" | |||
|'''Resist''' | |||
|'''ZEP520A''' | |||
|'''ZEP7000''' | |||
|'''PMMA''' | |||
|'''MMA''' | |||
|'''CSAR''' | |||
|'''HSQ/XR-1541''' | |||
|'''Ma-N 2403''' | |||
|'''Mr EBL 6000''' | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|'''Polarity''' | |||
|Positive | |||
|Positive | |||
|Positive | |||
|Positive | |||
|Positive | |||
|Negative | |||
|Negative | |||
|Negative | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
|'''Manufacturer''' | |||
|ZEON | |||
|ZEON | |||
| | |||
|AllResist | |||
|AllResist | |||
|DOW Corning | |||
|Micro Resist | |||
|Micro Resist | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|'''Comments''' | |||
|Standard positive resist. Technical Report to be found here: | |||
|Toxic, low dose to clear. Please contact Lithography. Technical Report to be found here: | |||
|Technical Report to be found here: | |||
|Approved, not tested yet. Used for trilayer (PEC-free) resist-stack or double-layer lift-off resist stack. Technical Report to be found here: | |||
|Approved, not tested yet. Technical Report to be found here: | |||
|Approved, not tested yet. Should work quite similar as ZEP520A. Please contact Lithography. Technical Report to be found here: | |||
|Standard negative resist | |||
|CC | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
|'''Spinner''' | |||
|SSE, Manual Spinner 1, III-V Spinner | |||
|Manual Spinner 1, III-V spinner | |||
|Manual Spinner 1, III-V spinner | |||
|Manual Spinner 1, III-V spinner | |||
|Manual Spinner 1, III-V spinner | |||
|Manual Spinner 1, III-V spinner | |||
|Manual Spinner 1, III-V spinner | |||
|Manual Spinner 1, III-V spinner | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
|'''Developer''' | |||
|AA | |||
|AA | |||
|AA | |||
|AA | |||
|AA | |||
|BB | |||
|BB | |||
|BB | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
|'''Rinse''' | |||
|AA | |||
|AA | |||
|AA | |||
|AA | |||
|AA | |||
|BB | |||
|BB | |||
|BB | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
|'''Remover''' | |||
|AA | |||
|AA | |||
|AA | |||
|AA | |||
|AA | |||
|BB | |||
|BB | |||
|BB | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
|'''Process Flow (docx-format)''' | |||
|AA | |||
|AA | |||
|AA | |||
|AA | |||
|AA | |||
|BB | |||
|BB | |||
|BB | |||
|} | |||
= Proximity Error Correction = | = Proximity Error Correction = | ||