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[[Image:Process_Flow_ZEP.jpg|400x400px|'''Process Flow for standard ZEP spinning, e-beam exposure and developing.''']]
[[Image:Process_Flow_ZEP.jpg|400x400px|Link=Process_Flow_ZEP.docx]]
 
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You can use the SSE-spinner, the Manual Spinner 1 or the III-V spinner to coat wafer or chips with e-beam resist. Read more about these spinners  
You can use the SSE-spinner, the Manual Spinner 1 or the III-V spinner to coat wafer or chips with e-beam resist. Read more about these spinners  
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