Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride: Difference between revisions
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Deposition of Silicon Nitride can be done with either LPCVD or PECVD. | Deposition of Silicon Nitride can be done with either LPCVD (Low Pressure Chemical Vapor Deposition) or PECVD (Plasma Enhanced Chemical Vapor Deposition). | ||
==Deposition of Silicon Nitride using LPCVD== | ==Deposition of Silicon Nitride using LPCVD== | ||