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| {| border="2" cellspacing="0" cellpadding="10"
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| !style="background:silver; color:black;" align="left"|Purpose
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| |style="background:LightGrey; color:black"|Film thickness measurements and optical characterization of optically transparent thin films||style="background:WhiteSmoke; color:black"|
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| *Measurement of (multi layer) film thickness (only one unknown layer)
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| *Optical constants
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| !style="background:silver; color:black" align="left"|Performance
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| |style="background:LightGrey; color:black"|Thin film materials that can be measured||style="background:WhiteSmoke; color:black"|
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| Any film that is transparent to the light in the given wavelength range
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| ex:
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| *Silicon Oxide
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| *Silicon nitride
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| *PolySilicon
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| *Photoresists
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| *SU8
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| *Other polymers
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| *Very thin layers of metals (<20 nm)
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| *and many more
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| |style="background:silver; color:black"|
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| |style="background:LightGrey; color:black"|Film thickness range
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| |style="background:WhiteSmoke; color:black"|
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| *~20Å to 2 µm (depending of the material)
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| !style="background:silver; color:black" align="left"|Process parameter range
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| |style="background:LightGrey; color:black"|Wavelength range
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| |style="background:WhiteSmoke; color:black"|
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| *300-950 nm
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| !style="background:silver; color:black" align="left"|Substrates
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| |style="background:LightGrey; color:black"|Batch size
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| |style="background:WhiteSmoke; color:black"|
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| *One sample at a time - all sample larger than about 1x1 cm<sup>2</sup>sizes up to about 6"
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| |style="background:silver; color:black"|
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| |style="background:LightGrey; color:black"|Substrate material allowed
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| |style="background:WhiteSmoke; color:black"|
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| *In principle all materials
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| |}
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