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Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,527 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,527 edits
Line 192: Line 192:
*T1 MiR 701 2um no HMDS
*T1 MiR 701 2um no HMDS
*T1 MiR 701 2um with HMDS
*T1 MiR 701 2um with HMDS
Spin-of: 30 s at 9990 rpm.
Spin-of: 30 s at 2600 rpm.


Tested ?? (with HMDS) on fresh silicon: ? µm.
Tested ?? (with HMDS) on fresh silicon: ? µm.
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