Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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Process: 10s contact bake, 30s vacuum bake, 72s HMDS priming, 5s cooling. | Process: 10s contact bake, 30s vacuum bake, 72s HMDS priming, 5s cooling. | ||
Tested 7/5 2013 on 110nm oxide: 81.4°. Tested 12/6 2013 on 3µm oxide: 81.8°. Tested 20/6 on 15µm oxide: 68-70°. | Tested 7/5 2013 on 110nm oxide: 81.4°. Tested 12/6 2013 on 3µm oxide: 81.8°. Tested 20/6 on 15µm oxide (dehydrated 1 hour at 250°C): 68-70°. Tested 20/6 on 15µm oxide (dehydrated 18 hours at 250°C): 71°. | ||
====AZ MiR 701 (29cps) coating==== | ====AZ MiR 701 (29cps) coating==== | ||