Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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 *Coating and baking of AZ MiR 701 (29cps) resist
 *Coating and baking of AZ nLOF 2020 resist
-*Post-exopsure baking at 110°C
+*Post-exposure baking at 110°C
 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance
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 *Allowed material 2
 *Allowed material 3
+|style="background:WhiteSmoke; color:black"|
+*Silicon
+*Glass
 |-
 |}