Jump to content

Specific Process Knowledge/Lithography/Coaters: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 20: Line 20:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*In-line substrate HMDS priming
*In-line substrate HMDS priming
*Spinning and baking of AZ MiR 701 (29cps) resist
*Coating and baking of AZ MiR 701 (29cps) resist
*Spinning and baking of AZ nLOF 2020 resist
*Coating and baking of AZ nLOF 2020 resist
*Post-exopsure baking at 110°C
*Post-exopsure baking at 110°C
|-
|-
Line 86: Line 86:
*<nowiki>1</nowiki> 100 mm wafers
*<nowiki>1</nowiki> 100 mm wafers
*<nowiki>1</nowiki> 150 mm wafers  
*<nowiki>1</nowiki> 150 mm wafers  
|style="background:WhiteSmoke; color:black"|
*<nowiki>25</nowiki> 100 mm wafers
|-
|-
| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Coaters"