Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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 |style="background:WhiteSmoke; color:black"|<b>SSE Spinner</b>
 |style="background:WhiteSmoke; color:black"|<b>KS Spinner</b>
+|style="background:WhiteSmoke; color:black"|<b>Spin Track 1 + 2</b>
 |-
 !style="background:silver; color:black;" align="center"|Purpose
 |style="background:LightGrey; color:black"|
 |style="background:WhiteSmoke; color:black"|
-*Spinning and baking of AZ2514E resist
+*Spinning and baking of AZ5214E resist
 *Spinning and baking of AZ4562 resist
 *Spinning and baking of e-beam resist
 |style="background:WhiteSmoke; color:black"|
-*Spinning and baking of AZ2514E resist
+*Spinning and baking of AZ5214E resist
 *Spinning and baking of AZ4562 resist
 *Spinning and baking of SU8 resist
+|style="background:WhiteSmoke; color:black"|
+*In-line substrate HMDS priming
+*Spinning and baking of AZ MiR 701 (29cps) resist
+*Spinning and baking of AZ nLOF 2020 resist
+*Post-exopsure baking at 110°C
 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance
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 * Single substrate
 * Non-vacuum chuck for fragile substrates
+|style="background:WhiteSmoke; color:black"|
+* Cassette-to-cassette
 |-
 |style="background:LightGrey; color:black"|Permanent media