Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|style="background:LightGrey; color:black"|Beam current range | |style="background:LightGrey; color:black"|Beam current range | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*0.1nA to 20nA in normal conditions | *0.1nA to 20nA in normal conditions (see available condition files | ||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=log&mach=292&type=status|here]) | |||
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|style="background:LightGrey; color:black"|Dose range | |style="background:LightGrey; color:black"|Dose range | ||