Specific Process Knowledge/Lithography/Coaters/SprayCoater: Difference between revisions
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==Spray Coater== | ==Spray Coater== | ||
[[image:1042_spraycoater_overview.jpg|400x239px|right|thumb|Spray Coater in Cleanroom 3]] | [[image:1042_spraycoater_overview.jpg|400x239px|right|thumb|Spray Coater in Cleanroom 3]] | ||
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Spin Track 1 + 2 is an SVG 88 series track system from Rite Track. Both tracks have a HMDS priming module, a spin coater, and a hotplate. In fack, the only difference between the two tracks is the resist used in the spin coating. Spin Track 1 + 2 is capable of handling 150 mm wafers, as well as 100 mm wafets, but is currently set up for 100 mm wafer processing. | Spin Track 1 + 2 is an SVG 88 series track system from Rite Track. Both tracks have a HMDS priming module, a spin coater, and a hotplate. In fack, the only difference between the two tracks is the resist used in the spin coating. Spin Track 1 + 2 is capable of handling 150 mm wafers, as well as 100 mm wafets, but is currently set up for 100 mm wafer processing. | ||