Specific Process Knowledge/Lithography/Coaters: Difference between revisions

From LabAdviser
← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,292 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,292 edits
Line 99: Line 99:


==Spin Track 1 + 2==
==Spin Track 1 + 2==
[[image:Cluster1.jpg|200x200px|right|thumb|Image(s) of the equipment(s)]]


'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Track_1_.2B_2 click here]'''
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Track_1_.2B_2 click here]'''
Line 107: Line 109:
'''The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:'''  
'''The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:'''  
<!-- remember to remove the type of documents that are not present -->
<!-- remember to remove the type of documents that are not present -->
[[image:Cluster1.jpg|200x200px|right|thumb|Image(s) of the equipment(s)]]


<!-- give the link to the equipment info page in LabManager: -->
<!-- give the link to the equipment info page in LabManager: -->

Revision as of 13:09, 12 June 2013

Coaters: Comparison Table

Equipment SSE Spinner KS Spinner
Purpose
  • Spinning and baking of AZ2514E resist
  • Spinning and baking of AZ4562 resist
  • Spinning and baking of e-beam resist
  • Spinning and baking of AZ2514E resist
  • Spinning and baking of AZ4562 resist
  • Spinning and baking of SU8 resist
Performance Substrate handling
  • Cassette-to-cassette
  • Edge handling chuck
  • Single substrate
  • Non-vacuum chuck for fragile substrates
Permanent media
  • AZ5214E resist
  • AZ4562 resist
  • Acetone for chuck cleaning
  • Acetone for drip pan
  • AZ5214E resist
  • PGMEA for edge bead removal
  • Acetone for chuck cleaning
Manual dispense option
  • 2 automatic syringes
  • yes
  • pneumatic dispense for SU8 resist
Process parameter range Parameter 1
  • Range
  • Range
Parameter 2
  • Range
  • Range
Substrates Batch size
  • 24 50 mm wafers
  • 24 100 mm wafers
  • 24 150 mm wafers
  • 1 100 mm wafers
  • 1 150 mm wafers
Allowed materials
  • Allowed material 1
  • Allowed material 2
  • Allowed material 1
  • Allowed material 2
  • Allowed material 3


SSE Spinner

The SSE spinner MAXIMUS: positioned in Cleanroom 13.


The SSE spinner MAXIMUS: positioned in Cleanroom 13. SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning on 2", 4" and 6" substrates.

The system is equipped with 2 different resists lines:

  • AZ5214E and
  • AZ4562 and
  • 2 syringe lines, which can be used for spinning of e-beam resist.

The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager: Equipment info in LabManager

A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here.

Spin Track 1 + 2

File:Cluster1.jpg
Image(s) of the equipment(s)

Feedback to this page: click here

Write a short description of the equipment(s).

The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:

LabManager

Process information

Link to process pages - e.g. one page for each material

Example:

Equipment performance and process related parameters

Equipment Equipment 1 Equipment 2
Purpose
  • Purpose 1
  • Purpose 2
  • Purpose 1
  • Purpose 2
  • Purpose 3
Performance Response 1
  • Performance range 1
  • Performance range 2
  • Performance range 1
  • Performance range 2
  • Performance range 3
Response 2
  • Performance range
  • Performance range
Process parameter range Parameter 1
  • Range
  • Range
Parameter 2
  • Range
  • Range
Substrates Batch size
  • # small samples
  • # 50 mm wafers
  • # 100 mm wafers
  • # 150 mm wafers
  • # small samples
  • # 50 mm wafers
  • # 100 mm wafers
  • # 150 mm wafers
Allowed materials
  • Allowed material 1
  • Allowed material 2
  • Allowed material 1
  • Allowed material 2
  • Allowed material 3


KS Spinner

The KS spinner is placed in Cleanroom 3.

A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here.


A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here.


Manual Spinner 1 (Laurell)

The Manual Spinner(Polymers) is placed in fumehood in Cleanroom 3.

A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here.

A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here.

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Coaters&oldid=10208"