Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions
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= The ASE = | = The ASE = | ||
[[image:ASE.jpg|200x200px|right|thumb|The ICP-DRIE tool at Danchip: STS ASE - positioned in cleanroom2]] | |||
The ICP-DRIE (Inductively Coupled Plasma - Deep Reactive Ion Etcher) tool at Danchip is manufactured by STS and is called the ASE (Advanced Silicon Etcher). The main purpose of the ASE is etching of silicon using Bosch process. | The ICP-DRIE (Inductively Coupled Plasma - Deep Reactive Ion Etcher) tool at Danchip is manufactured by STS and is called the ASE (Advanced Silicon Etcher). The main purpose of the ASE is etching of silicon using Bosch process. | ||