Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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|'''Resist''' | |||
|'''Polarity''' | |||
|'''Manufacturer''' | |||
|'''Comments''' | |||
|'''Technical reports''' | |||
|'''Spinner''' | |||
|'''Developer''' | |||
|'''Rinse''' | |||
|'''Remover''' | |||
|'''Process flows (in docx-format)''' | |||
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|'''AZ5214E''' | |||
|Positive | |||
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|'''AZ4562''' | |||
|Positive | |||
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|'''AZ MiR 701''' | |||
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|'''AZ nLOF 2020''' | |||
|Negative | |||
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|'''SU8''' | |||
|Positive | |||
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Revision as of 07:56, 12 August 2013
Process | Resist Type | Comment 1 | Comment 2 | Comment 3 |
---|---|---|---|---|
Lift off | NLOF | AA | BB | CC |
Dry Etch | DD
|
EE | FF | GG |
Wet Etch | HH
|
II | JJ | KK |
Resist | Comments | Pre-treatment | Resist Coating | Exposure | Baking | Developing | Stripping, Lift-off |
---|---|---|---|---|---|---|---|
AA | AA | AA | AA | AA | AA | AA | AA |
BB | BB | BB | BB | BB | BB | BB | BB |
CC | CC | CC | CC | CC | CC | CC | CC |
Resist | Polarity | Manufacturer | Comments | Technical reports | Spinner | Developer | Rinse | Remover | Process flows (in docx-format) |
AZ5214E | Positive |
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AZ4562 | Positive | ||||||||
AZ MiR 701 | |||||||||
AZ nLOF 2020 | Negative |
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SU8 | Positive |
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