Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions

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 == Recipes on the ASE ==
-=== [[Shallolr]] ===
+=== Shallolr ===
-The shallolr recipe is designed to etch features (with sizes above 1 <math>\mu</math>m) in silicon down to a depth that ranges from a few microns to some 50 microns. If you need to etch deeper use [[Deepetch]] or more shallow, see [[Nanoetches]].
+The shallolr recipe is designed to etch features (with sizes above 1 <math>\mu</math>m) in silicon down to a depth that ranges from a few microns to some 50 microns. If you need to etch deeper use Deepetch or more shallow, see Nanoetches.
+The recipe is given below.
 {| border="2" cellpadding="2" cellspacing="1" align="left"
 |+ The shallolr recipe
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 | 5 s
 |}
+[[image:jmlshal070921 pos1 2mu_09.jpg|370x370px|thumb|right|Standardization image of the profile of a 2 <math>\mu</math>m trench]]