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Specific Process Knowledge/Thin film deposition/Deposition of Tungsten/Sputtering of W in Sputter Coater 3: Difference between revisions

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<gallery caption="Deposition of W on low aspect ratio Si trench structures." widths="450px" heights="500px" perrow="3">
<gallery caption="Deposition of W on low aspect ratio Si trench structures." widths="270px" heights="250px" perrow="3">
image:eves_W_sputter_coater_3_big_glass_trench_01_20220915.png| SEM image. 80mA 300s+300s deposition time.  
image:eves_W_sputter_coater_3_big_glass_trench_01_20220915.png| SEM image. 80mA 300s+300s deposition time.  
image:eves_W_sputter_coater_3_big_glass_trench_02_20220915.png| SEM image. 80mA 300s+300s deposition time.  
image:eves_W_sputter_coater_3_big_glass_trench_02_20220915.png| SEM image. 80mA 300s+300s deposition time.  
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