Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions

← Older editNewer edit →
VisualWikitext
Mmat (talk | contribs)
NLAB-Employees-701, NLAB-LabmanagerAllUsers, Administrators
1,963 edits
Mmat (talk | contribs)
NLAB-Employees-701, NLAB-LabmanagerAllUsers, Administrators
1,963 edits
Line 390: Line 390:
|}
|}


==Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride. <span style="color:Red">Expired!</span>:PECVD1 has been decommissioned==
==Recipes on PECVD1 for Deposition of Silicon Nitride and Silicon Oxynitride==
'''<span style="color:Red">Expired Recipes! The PECVD1 has been decomissioned and is no longer available.</span>'''
===Recipes===
===Recipes===
{| border="1" cellspacing="0" cellpadding="7"
{| border="1" cellspacing="0" cellpadding="7"
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_PECVD"