Jump to content

Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions

Eves (talk | contribs)
Eves (talk | contribs)
Line 419: Line 419:
Additinal information about the processes and equipment performace can be found  here:
Additinal information about the processes and equipment performace can be found  here:


*Pre-acceptance test[[Media:Cluster-based multi-chamber high vacuum sputtering deposition system pre acceptance.pptx]]
*Pre-acceptance test [[Media:Cluster-based multi-chamber high vacuum sputtering deposition system pre acceptance.pptx]]


*Acceptance test[[Media:Cluster-based multi-chamber high vacuum sputtering deposition system Acceptance.pptx]]
*Acceptance test [[Media:Cluster-based multi-chamber high vacuum sputtering deposition system Acceptance.pptx]]