Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions

Revision as of 17:14, 22 March 2020 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Load-lock ← Older edit		Revision as of 17:15, 22 March 2020 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Distribution Chamber (Genmark robot) Newer edit →
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	==Distribution Chamber (Genmark robot)==		==Distribution Chamber (Genmark robot)==

	The load-lock and process chambers PC1 and PC3 are all connected through the common distribution chamber. The robot arm can transfer the sample to the selected destination. During normal operation, the chamber is pumped to a base pressure ensuring the safe transfer of the sample between chambers and load-lock without breaking a vacuum.		The load-lock and process chambers PC1 and PC3 are all connected through the common distribution chamber. The robot arm can transfer the sample to the selected destination. During normal operation, the chamber is pumped to a base pressure ensuring the safe transfer of the sample between chambers and load-lock without breaking a vacuum. The unit is conectedto its own turbo-pump.