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Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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<!-- give the link to the equipment info page in LabManager: -->
<!-- give the link to the equipment info page in LabManager: -->
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=244 Sputter-System(Lesker) in LabManager]
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&page_id=169 Sputter-System(Lesker) in LabManager]
 


= Sputter-System Metal-Oxide(PC1) =
= Sputter-System Metal-Oxide(PC1) =
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system"