LabAdviser/Technology Research/Nanoscale characterization of ultra-thin metal films for nanofabrication applications: Difference between revisions
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[[File: | [[File:1.png|500px|thumb|Fig. 1. Schematic representation of the "thin-film structure-property causality" approach for the fabrication of thin-films. The study of the interaction between thin-films is added as fundamental step in the process.]] | ||
The deposition of metal thin-film structures on dielectric or semiconductor substrates is central for the fabrication of structures and devices having nanoscale characteristic dimension. With the constant miniaturization of the devices and the fabrication of increasingly complex multi-material structures, the interaction between different ultra-thin layers has gained considerable importance in the field of thin-film science and technology in recent years. Therefore the characterization of such interactions in a wide range of temperatures and the description of their impact on the chemical composition, morphology and distribution of crystallographic orientations of multilayer thin-films is of utmost importance. | The deposition of metal thin-film structures on dielectric or semiconductor substrates is central for the fabrication of structures and devices having nanoscale characteristic dimension. With the constant miniaturization of the devices and the fabrication of increasingly complex multi-material structures, the interaction between different ultra-thin layers has gained considerable importance in the field of thin-film science and technology in recent years. Therefore the characterization of such interactions in a wide range of temperatures and the description of their impact on the chemical composition, morphology and distribution of crystallographic orientations of multilayer thin-films is of utmost importance. | ||