LabAdviser/Technology Research/Nanoscale characterization of ultra-thin metal films for nanofabrication applications: Difference between revisions
Appearance
| Line 42: | Line 42: | ||
*: [https://doi.org/10.1016/j.mee.2018.02.023 Link to Article] | *: [https://doi.org/10.1016/j.mee.2018.02.023 Link to Article] | ||
*: A. Han, B. Chang, M. Todeschini, H. T. Le, <u>W. Tiddi</u> and M. Keil<br> ''Microelectronic Engineering'', vol. 193, pp. 28-33, 2018. | *: A. Han, B. Chang, M. Todeschini, H. T. Le, <u>W. Tiddi</u> and M. Keil<br> ''Microelectronic Engineering'', vol. 193, pp. 28-33, 2018. | ||
===Conferences and Workshops Contributions=== | ===Conferences and Workshops Contributions=== | ||
2017 | |||
*; Organic ice resists - condensed small molecules as spin-free volatile E-beam resists | *; Organic ice resists - condensed small molecules as spin-free volatile E-beam resists | ||
*: <u>W. Tiddi</u>, A. Elsukova, H. T. Le, M. Beleggia, and A. Han<br> Oral presentation at ''43rd International conference on Micro and Nano Engineering'', Braga, Portugal, 2017. | *: <u>W. Tiddi</u>, A. Elsukova, H. T. Le, M. Beleggia, and A. Han<br> Oral presentation at ''43rd International conference on Micro and Nano Engineering'', Braga, Portugal, 2017. | ||
2016 | |||
2015 | |||
*; Ice lithography - ice-based nanopatterning | *; Ice lithography - ice-based nanopatterning | ||