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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,324 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,324 edits
Line 202: Line 202:
|MFSiNLS2
|MFSiNLS2
|~422 (''bghe Feb 2016'')
|~422 (''bghe Feb 2016'')
|~?
|~2.03
|?
|~2
|~6 (''bghe Feb 2016'')
|~6 (''bghe Feb 2016'')
|~2.1 (''bghe Feb 2016'')
|~2.1 (''bghe Feb 2016'')
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