Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Boron doped poly-Si and a-Si: Difference between revisions
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[[image:Boron concentration2.jpg|627x424px|left|thumb|Boron concentration measured by SIMS. Result from Thomas Pedersen, Nanotech, Sep 2015.]] | [[image:Boron concentration2.jpg|627x424px|left|thumb|Boron concentration measured by SIMS. Result from Thomas Pedersen, Nanotech, Sep 2015.]] | ||
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== Boron-doped amorphous silicon by using 4" LPCVD polysilicon furnace (B4) == | == Boron-doped amorphous silicon by using 4" LPCVD polysilicon furnace (B4) == | ||