Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Boron doped poly-Si and a-Si: Difference between revisions
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==Boron-doped amorphous silicon by using 4" LPCVD polysilicon furnace (B4) == | |||
== Boron-doped amorphous silicon by using 4" LPCVD polysilicon furnace (B4) == | |||
''Result from Trine Holm Christensen, @Space, Feb. 2015'' | ''Result from Trine Holm Christensen, @Space, Feb. 2015'' | ||