Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions
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|RF-power | |RF-power | ||
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*LF: | *LF: 30 W 2s | ||
*HF: 20 W 6s | *HF: 20 W 6s | ||
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==Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride. <span style="color:Red">Expired!</span>:PECVD1 has been decommissioned== | ==Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride. <span style="color:Red">Expired!</span>:PECVD1 has been decommissioned== | ||