Jump to content

Specific Process Knowledge/Etch/Etching of Platinum: Difference between revisions

← Older edit
VisualWikitext
BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
Mbec (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
194 edits
No edit summary
 
(8 intermediate revisions by 4 users not shown)
Line 1: Line 1:
'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''


=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
'''All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.'''


'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Platin click here]'''


 
[[Category: Equipment|Etch Wet Platinum]]
 
[[Category: Etch (Wet) bath|Platinum]]
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Platin click here]'''


==Etching of Platinum==
==Etching of Platinum==
Line 22: Line 23:
|-style="background:silver; color:black"
|-style="background:silver; color:black"
!
!
![[Specific Process Knowledge/Etch/Wet Patinum Etch|Pt wet etch]]
![[Specific Process Knowledge/Etch/Wet Platinum Etch|Pt wet etch]]
![[Specific_Process_Knowledge/Etch/IBE&frasl;IBSD Ionfab 300|IBE (Ionfab300+)]]
![[Specific_Process_Knowledge/Etch/IBE&frasl;IBSD Ionfab 300|IBE (Ionfab300+)]]
|-
|-
Line 37: Line 38:
!Etch rate range
!Etch rate range
|
|
*~100nm/min
*~ 1 - 10 nm/min (not tested yet)
|
|
*~55nm/min (not tested yet)  
*~30nm/min (not tested yet)  
|-
|-


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/Etching_of_Platinum"