Specific Process Knowledge: Difference between revisions
No edit summary |
mNo edit summary |
||
| (256 intermediate revisions by 8 users not shown) | |||
| Line 1: | Line 1: | ||
=== Choose the process topic you are interested in === | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge click here]''' | ||
=== Choose the process topic you are interested in: === | |||
*[[/Pattern Design|Pattern Design and Mask Fabrication]] | |||
*[[/Back-end processing|Back-end processing]] | *[[/Back-end processing|Back-end processing]] | ||
| Line 7: | Line 11: | ||
*[[/Characterization|Characterization]] | *[[/Characterization|Characterization]] | ||
*[[/ | *[[/Direct Structure Definition|Direct Structure Definition]] | ||
*[[/Doping|Doping]] | |||
*[[/Etch|Etch]] | *[[/Etch|Etch]] | ||
| Line 13: | Line 19: | ||
*[[/Imprinting|Imprinting]] | *[[/Imprinting|Imprinting]] | ||
*[[/Lithography|Lithography]] | |||
*[[/Thermal Process|Thermal Process]] | *[[/Thermal Process|Thermal Process]] | ||
| Line 26: | Line 31: | ||
*[[/Wafer Information|Wafer Information]] | *[[/Wafer Information|Wafer Information]] | ||
*[[/ | *[[/Overview of Fume Hoods|Overview of Fume Hoods]] | ||
*[[/Cleanroom Chemicals|List of chemicals available in the cleanroom]] | |||
<!-- <HTML5video width="520" height="320" autoplay="true" loop="true">bunny</HTML5video> --> | |||