Specific Process Knowledge/Etch/ICP Metal Etcher/Titanium: Difference between revisions
Created page with "=== Titanium etch === {| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" |+ '''Ti etch''' |- ! Parameter ! width="200" | Process 1 ! width="200" | Proc..." |
No edit summary |
||
| (7 intermediate revisions by 2 users not shown) | |||
| Line 1: | Line 1: | ||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/Titanium click here]''' | |||
<!--Checked for updates on 5/10-2020 - ok/jmli --> | |||
<!--Checked for updates on 30/7-2018 - ok/jmli --> | |||
=== Titanium etch === | === Titanium etch === | ||
{{Template:Author-jmli1}} | |||
<!--Checked for updates on 2/02-2023 - ok/jmli --> | |||
Latest revision as of 16:05, 2 February 2023
Feedback to this page: click here
Titanium etch
Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab
| Parameter | Process 1 | Process 2 |
|---|---|---|
| Cl2 (sccm) | 30 | 30 |
| HBr (sccm) | - | - |
| Pressure (mTorr) | 3, Strike 3 secs @ 15 mTorr??? | 3 |
| Coil power (W) | 800 | 900 |
| Platen power (W) | 100 | 50 |
| Temperature (oC) | 20 | 20 |
| Spacers (mm) | 30 | 30 |
| Etch rate (nm/min) | 152 | 64 |
| AZ resist selectivity | 0.67 | 0.83 |