Specific Process Knowledge/Etch/DRIE-Pegasus/nanobosch/nanobosch6: Difference between revisions
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== Test run using AZ resist 24/9-2012 == | == Test run using AZ resist 24/9-2012 == | ||
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image:Peg-C01296.05-no.14.jpg| | image:Peg-C01296.05-no.14.jpg| | ||
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== Test run using AZ resist 24/9-2012 == | == Test run using AZ resist 24/9-2012 == | ||
Latest revision as of 15:18, 24 August 2021
Test run using AZ resist 24/9-2012
| Substrate information | Wafer | C01296.05 |
|---|---|---|
| Mask | Travka50 mask in a few microns of AZ resist | |
| Date | 24/9-2012 | |
| Tool | Pegasus | |
| Process | Recipe | nanobosch6 |
| Tool conditioning | 3 minute TDESC clean | |
| Process duration | 15 minutes | |
| Purpose | test | |
| Characterisation | SEM Zeiss |
- SEM images
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-
-
Test run using AZ resist 24/9-2012
| Substrate information | Wafer | C01296.09 |
|---|---|---|
| Mask | Travka80 mask in a few microns of AZ resist | |
| Date | 24/9-2012 | |
| Tool | Pegasus | |
| Process | Recipe | nanobosch6 |
| Tool conditioning | 3 minute TDESC clean | |
| Process duration | 15 minutes | |
| Purpose | test | |
| Characterisation | SEM Zeiss |
- SEM images
-
-
-
