Specific Process Knowledge/Lithography/SU-8: Difference between revisions
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'''Exposure in maskless aligner:'''<br> | '''Exposure in maskless aligner:'''<br> | ||
The required dose at 365 nm (MLA1) is higher than the optimal dose for | The required dose at 365 nm (MLA1) is higher than the optimal dose for mask aligner, typically by a factor of approximately 1.4. For exposure at 375 nm (MLA2), the required dose is significantly higher than at 365 nm, by a factor of 5-10. | ||
==Developing== | ==Developing== | ||