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Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD  click here]''' <br>
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD  click here]''' <br>


[[index.php?title=Category:Equipment|Thin film PECVD]]
[[index.php?title=Category:Thin Film Deposition|PECVD]]


==PECVD Plasma Enhanced Chemical Vapor Deposition==
==PECVD Plasma Enhanced Chemical Vapor Deposition==
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*SiH<sub>4</sub>:0-60 sccm
*SiH<sub>4</sub>:0-60 sccm
*N<sub>2</sub>O:0-3000 sccm
*N<sub>2</sub>O:0-3000 sccm
*NH<sub>3</sub>:0-300 sccm
*NH<sub>3</sub>:0-287 sccm
*N<sub>2</sub>:0-3000 sccm
*N<sub>2</sub>:0-3000 sccm
*Ar:0-1000 sccm
*Ar:0-1415 sccm
*5%PH<sub>3</sub>:0-100 sccm
*5%PH<sub>3</sub>:0-100 sccm
*3%B<sub>2</sub>H<sub>6</sub>:0-850 sccm
*3%B<sub>2</sub>H<sub>6</sub>:0-270 sccm
|-
|-
!style="background:silver; color:black" align="left" rowspan="3" valign="top" |Substrates
!style="background:silver; color:black" align="left" rowspan="3" valign="top" |Substrates
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