Specific Process Knowledge/Lithography: Difference between revisions
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=Lithography= | =Lithography= | ||
[[file:DUV_wafers.jpg|400px|thumb|right| | [[file:DUV_wafers.jpg|400px|thumb|right|Waveguides created using DUV lithography.]] | ||
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*[[Specific Process Knowledge/Lithography/Coaters/RCD8|Spin Coater: RCD8]] | *[[Specific Process Knowledge/Lithography/Coaters/RCD8|Spin Coater: RCD8]] | ||
*[[Specific_Process_Knowledge/Lithography/Coaters/labspin|Spin Coater: Labspin 02/03]] | *[[Specific_Process_Knowledge/Lithography/Coaters/labspin|Spin Coater: Labspin 02/03]] | ||
*[[Specific_Process_Knowledge/Lithography/Coaters/ | *[[Specific_Process_Knowledge/Lithography/Coaters/labspin05|Spin Coater: Labspin 05 (PFL)]] | ||
'''[[Specific Process Knowledge/Lithography/Coaters|Spray coating]]''' | '''[[Specific Process Knowledge/Lithography/Coaters|Spray coating]]''' | ||