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Specific Process Knowledge/Lithography/UVExposure/aligner MA6-1: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
2,001 edits
No edit summary
 
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|-
|-
! style="text-align:left" | Location:  
! style="text-align:left" | Location:  
| style="padding-left: 10px" | Cleanroom E-4
| style="padding-left: 10px" | PolyFabLab
|}
|}


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|-
|-
! scope=row style="text-align: left;" | Purpose
! scope=row style="text-align: left;" | Purpose
| Alignment and UV exposure
| Mask alignment and UV exposure
|-
|-
! scope=row style="text-align: left;" | Exposure modes
! scope=row style="text-align: left;" | Exposure modes
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==Alignment mark design and locations==
==Alignment mark design and locations==
[[Specific_Process_Knowledge/Pattern_Design#Alignment_marks|Alignment mark design and locations]].
[[Specific_Process_Knowledge/Pattern_Design#Alignment_marks|Alignment mark design and locations]].
<!--
==Quality Control (QC)==
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Control (QC) for KS Aligner'''
|-
|
*[http://labmanager.dtu.dk/d4Show.php?id=5644&mach=44 The QC procedure for Aligner: MA6-1] - '''requires login'''<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=44 The newest QC data for Aligner: MA6-1] - '''requires login'''
{| {{table}}
| align="center" |
{| border="1" cellspacing="1" cellpadding="2"  align="center" style="width:300px"
! QC Recipe:
! Manual intensity measurement
|-
|Measurement area
|100 mm
|-
|Number of measurements
|5
|-
|}
| align="center" valign="top"|
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px"
!QC limits
!Aligner: MA6-1
|-
|Nominal intensity
|8 mW/cm<sup>2</sup> @ 365 nm
|-
|Intensity deviation from nominal
|≤5%
|-
|Intensity non-uniformity
|≤2%
|-
|}
|-
|}
Power supply and/or lamp will be adjusted if intensity is outside the limit.
|}
-->
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