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=Aligner: MA6-1=
=Aligner: MA6-1=
[[Image:KSAligner in E-4.jpg|400px|thumb|The Aligner: MA6-1 is located in PolyFabLab.]]
[[File:KSAligner in E-4.jpg|400px|thumb|The Aligner: MA6-1 is located in PolyFabLab.]]


SUSS Mask Aligner MA6 is designed for high resolution photolithography.
'''Tool description'''<br>
The 365nm exposure wavelength version is capable of 1.25 (1.0) um resolution in vacuum contact. All contact exposure programs (vacuum, hard, soft, proximity) are supplied.
The Aligner: MA6-1 is a manual UV exposure system, which can be used for mask alignment and exposure of UV resists on 100 mm substrates. It is also capable of flood exposing chips, 50 mm and 150 mm substrates.
Two alignment options are available: top side alignment (TSA) with a split field or a video microscope and back side alignment (BSA) with BSA microscope. It is also possible to make IR- light alignment.


{| class="wikitable"
! style="text-align:left" | Product:
| style="padding-left: 10px" | Süss mask aligner MA6
|-
! style="text-align:left" | Year of purchase:   
| style="padding-left: 10px" | 1999
|-
! style="text-align:left" | Location:
| style="padding-left: 10px" | PolyFabLab
|}


'''Training videos:'''  
'''User manual'''<br>
<br/>The training videos were made for MA6-2, but operation of MA6-1 is very similar as they are exactly the same model. Due to a different power supply, however, procedures for ignition and intensity control of the lamp is different for MA6-1. Please refer to the manual for the correct procedures.  
The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=44 LabManager] - '''requires login'''
 
'''Tool training'''<br>
Training on the tool requires users to complete the [https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography#Lithography_Tool_Package_Training lithography TPT] followed by reading the manual and watching the training videos. The tool authorization can be obtained after a successful hands-on authorization training session.<br>
 
The training videos were made for MA6-2, but operation of MA6-1 is very similar as they are exactly the same model. Due to a different power supply, however, procedures for ignition and intensity control of the lamp is different for MA6-1. Please refer to the manual for the correct procedures.  


[https://www.youtube.com/watch?v=o8IBtfQHNzU Operation]
[https://www.youtube.com/watch?v=o8IBtfQHNzU Operation]


[https://www.youtube.com/watch?v=rvUuXYgw-xU Alignment]
[https://www.youtube.com/watch?v=rvUuXYgw-xU Alignment]
<br clear="all" />


The user manual(s), quality control procedure(s) and results, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=44 LabManager]  - '''requires login'''
=Equipment performance and process related parameters=
 
==Exposure dose==
[[Specific Process Knowledge/Lithography/Resist/UVresist/exposureDoseMaskAligners#Aligner:_MA6-1|Information on UV exposure dose]]
 
==Process information==
The Aligner: MA6-1 has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm.
 
Link to information about [[Specific_Process_Knowledge/Pattern_Design#Alignment_marks|alignment mark design and locations]].
 
<!--
==Quality Control (QC)==
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Control (QC) for KS Aligner'''
|-
|
*[http://labmanager.dtu.dk/d4Show.php?id=5644&mach=44 The QC procedure for Aligner: MA6-1] - '''requires login'''<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=44 The newest QC data for Aligner: MA6-1] - '''requires login'''
{| {{table}}
| align="center" |
{| border="1" cellspacing="1" cellpadding="2"  align="center" style="width:300px"
 
! QC Recipe:
! Manual intensity measurement
|-
|Measurement area
|100 mm
|-
|Number of measurements
|5
|-
|}
| align="center" valign="top"|
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px"
!QC limits
!Aligner: MA6-1
|-
|Nominal intensity
|8 mW/cm<sup>2</sup> @ 365 nm
|-
|Intensity deviation from nominal
|≤5%
|-
|Intensity non-uniformity
|≤2%
|-
|}
|-
|}
Power supply and/or lamp will be adjusted if intensity is outside the limit.
|}
-->
 
==Equipment performance and process related parameters==


{| class="wikitable"
{| class="wikitable"
|-
|-
! scope=row style="text-align: left;" | Purpose
! scope=row style="text-align: left;" | Purpose
| Alignment and UV exposure
| Mask alignment and UV exposure
|-
|-
! scope=row style="text-align: left;" | Exposure modes
! scope=row style="text-align: left;" | Exposure modes
Line 112: Line 74:


<br clear="all" />
<br clear="all" />
=Process information=
The Aligner: MA6-1 has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm.
==Exposure dose==
[[Specific Process Knowledge/Lithography/Resist/UVresist/exposureDoseMaskAligners#Aligner:_MA6-1|Information on UV exposure dose]]
==Alignment mark design and locations==
[[Specific_Process_Knowledge/Pattern_Design#Alignment_marks|Alignment mark design and locations]].

Latest revision as of 13:46, 26 June 2026

Aligner: MA6-1

The Aligner: MA6-1 is located in PolyFabLab.

Tool description
The Aligner: MA6-1 is a manual UV exposure system, which can be used for mask alignment and exposure of UV resists on 100 mm substrates. It is also capable of flood exposing chips, 50 mm and 150 mm substrates.

Product: Süss mask aligner MA6
Year of purchase: 1999
Location: PolyFabLab

User manual
The user manual and contact information can be found in LabManager - requires login

Tool training
Training on the tool requires users to complete the lithography TPT followed by reading the manual and watching the training videos. The tool authorization can be obtained after a successful hands-on authorization training session.

The training videos were made for MA6-2, but operation of MA6-1 is very similar as they are exactly the same model. Due to a different power supply, however, procedures for ignition and intensity control of the lamp is different for MA6-1. Please refer to the manual for the correct procedures.

Operation

Alignment

Equipment performance and process related parameters

Purpose Mask alignment and UV exposure
Exposure modes
  • Vacuum contact
  • Hard contact
  • Soft contact
  • Proximity
  • Flood exposure
Exposure light/filters
  • 365 nm (i-line)
  • broadband (i-, g-, h-lines), requires tool change
  • 303 nm, requires tool change
Minimum resolution ~1.25 µm
Mask size 5x5 inches
Alignment modes
  • Top side (TSA): ±2 µm
  • Back side (BSA): ±5 µm
Substrate size
  • Mask exposure and alignment: 100 mm wafers
  • Flood exposure: from samples to 150 mm wafers
Allowed materials All PolyFabLab allowed materials
Substrate batch 1


Process information

The Aligner: MA6-1 has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm.

Exposure dose

Information on UV exposure dose

Alignment mark design and locations

Alignment mark design and locations.

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