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{{cc-nanolab}}
{{cc-nanolab}}


'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''
'''Feedback to this page''': '''[mailto:taran@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''


[[Category:Equipment|Lithography exposure]]
[[Category:Equipment|Lithography exposure]]
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=Mask Aligner vs Maskless Aligner=
=Mask Aligner vs Maskless Aligner=


Slides presented at NNUM in Uppsala 2026: [[Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']]
In the first half of 2026, a rather thorough investigation of the differences between exposure using mask aligner and maskless aligner was conducted. The result was presented as an advanced lithography tutorial at the 2026 Nordic Nanolab User Meeting in Uppsala, Sweden.
 
Slides presented at NNUM in Uppsala: [[Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']]


Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]]
Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]]


=Additional data=
=Data from the investigation=
<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]
<!-- <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]  
 
-->
==AZ 5214E==
<br clear="all" />
===Resolution===
==AZ 5214E==  
<br clear="all" />
===Resolution (AZ 5214E)===
<br clear="all" />
<br clear="all" />
'''Resolution at optimal processing conditions for 1.5µm AZ 5214E using different exposure equipment:'''
'''Resolution at optimal processing conditions for 1.5µm AZ 5214E using different exposure equipment:'''
Line 49: Line 53:
<br clear="all" />
<br clear="all" />


'''SEM images from different exposure equipment at optimal processing conditions:'''
'''SEM images from different exposure equipment for 1.5µm AZ 5214E at optimal processing conditions:'''


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
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<br clear="all" />
<br clear="all" />


'''SEM images of different size structures:'''
'''SEM images of different size structures for 1.5µm AZ 5214E:'''


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
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<br clear="all" />
<br clear="all" />


===Yield===
===Yield (AZ 5214E)===


The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.
The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.
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! width="460" |  
! width="460" |  


|+'''Wafer maps at optimal processing conditions for different aligners'''
|+'''Wafer maps for 1.5µm AZ 5214E at optimal processing conditions for different aligners'''
|- border="0" align="center"
|- border="0" align="center"
|[[Image:Map_MLA2_D90_F2.jpg|450px]]
|[[Image:Map_MLA2_D90_F2.jpg|450px]]
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! width="460" |  
! width="460" |  


|+'''Wafer maps at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
|+'''Wafer maps for 1.5µm AZ 5214E at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
|- border="0" align="center"
|- border="0" align="center"
|[[Image:Map_MA6-2_hard.jpg|450px]]
|[[Image:Map_MA6-2_hard.jpg|450px]]
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! width="460" |  
! width="460" |  


|+'''Wafer maps at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm<sup>2</sup>, probably over-exposed)'''
|+'''Wafer maps for 1.5µm AZ 5214E at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm<sup>2</sup>, probably over-exposed)'''
|- border="0" align="center"
|- border="0" align="center"
|[[Image:Map_MA6-1_hard.jpg|450px]]
|[[Image:Map_MA6-1_hard.jpg|450px]]
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! width="460" |   
! width="460" |   


|+'''Wafer maps at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
|+'''Wafer maps for 1.5µm AZ 5214E at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
|- border="0" align="center"
|- border="0" align="center"
|[[Image:Map_MA6-2_soft_WEC015.jpg|450px]]
|[[Image:Map_MA6-2_soft_WEC015.jpg|450px]]
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<br clear="all" />
<br clear="all" />


===Resist profile===
===Resist profile (AZ 5214E)===
<br clear="all" />
<br clear="all" />
====Linewidth and sidewall angle vs exposure dose (AZ 5214E)====
<br clear="all" />
'''Result of image analysis of SEM images of 2µm triplets:'''
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" | 


====Linewidth and sidewall angle vs exposure dose====
|+
|- border="0" align="center"
|[[Image:5214E_Linewidth vs dose.jpg|500px]]
|[[Image:5214E_Sidewall vs dose.jpg|500px]]
 
|- align="center"
| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). 
|}
<br clear="all" />
<br clear="all" />


'''SEM images as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
 
'''SEM images of 1.5µm AZ 5214E as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-
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<br clear="all" />
<br clear="all" />


'''SEM images as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:'''
'''SEM images of 1.5µm AZ 5214E as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-
Line 253: Line 273:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Trenches and Lines
|Trenches <br>and Lines
|[[Image:W13 mla2 5214E D80 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D80 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_04.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_04.jpg|280px]]
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<br clear="all" />
<br clear="all" />


====Linewidth and sidewall angle vs defocus parameter (AZ 5214E)====
<br clear="all" />
'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''


{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" |
! width="510" |  


|+
|+
|- border="0" align="center"
|- border="0" align="center"
|[[Image:5214E_Linewidth vs dose.jpg|500px]]
|[[Image:5214E_Profile vs defoc.jpg|500px]]
|[[Image:5214E_Sidewall vs dose.jpg|500px]]


|- align="center"
|- align="center"
| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
 
|}
|}
<br clear="all" />
<br clear="all" />


====Linewidth and sidewall angle vs defocus parameter====
<br clear="all" />


'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
'''SEM images of 1.5µm AZ 5214E as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-
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<br clear="all" />
<br clear="all" />


'''Result of image analysis of SEM images of 2µm triplets:'''
==AZ MiR 701==
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
<br clear="all" />
! width="510" |
===Resolution (AZ MiR 701)===
 
|+
|- border="0" align="center"
|[[Image:5214E_Profile vs defoc.jpg|500px]]
 
|- align="center"
| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
 
|}
<br clear="all" />
<br clear="all" />
==AZ MiR 701==
===Resolution===
* Table with optimal parameters and resolution for different aligners
* SEM pictures
'''Resolution at optimal processing conditions for 1.5µm AZ MiR 701 using different exposure equipment:'''
'''Resolution at optimal processing conditions for 1.5µm AZ MiR 701 using different exposure equipment:'''
{| class="wikitable"
{| class="wikitable"
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<br clear="all" />
<br clear="all" />


'''SEM images from different exposure equipment at optimal processing conditions:'''
'''SEM images of 1.5µm AZ MiR 701 from different exposure equipment at optimal processing conditions:'''


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
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<br clear="all" />
<br clear="all" />


===Resist profile (sidewall angle and linewidth)===
===Resist profile (AZ MiR 701)===
*SEM pictures to support graphs?
<br clear="all" />
 
====Linewidth and sidewall angle vs exposure dose (AZ MiR 701)====
<br clear="all" />


'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''
Line 404: Line 414:
| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).   
| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).   
|}
|}
<br clear="all" />
'''SEM images of 1.5µm AZ MiR 701 as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!160mJ/cm<sup>2</sup>
!190mJ/cm<sup>2</sup>
!220mJ/cm<sup>2</sup>
!250mJ/cm<sup>2</sup>
!280mJ/cm<sup>2</sup>
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W18 MA62 MiR vac D160_F8T_04.jpg|280px]]
|[[Image:W18 MA62 MiR vac D190_H6B_03.jpg|280px]]
|[[Image:W18 MA62 MiR vac D220_I3T_03.jpg|280px]]
|[[Image:W18 MA62 MiR vac D250_F3T_03.jpg|280px]]
|[[Image:W18 MA62 MiR vac D280_D5B_03.jpg|280px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W18 MA62 MiR vac D160_F8T_02.jpg|280px]]
|[[Image:W18 MA62 MiR vac D190_H6B_02.jpg|280px]]
|[[Image:W18 MA62 MiR vac D220_I3T_02.jpg|280px]]
|[[Image:W18 MA62 MiR vac D250_F3T_02.jpg|280px]]
|[[Image:W18 MA62 MiR vac D280_D5B_02.jpg|280px]]
|}
<br clear="all" />
'''SEM images of 1.5µm AZ MiR 701 as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!225mJ/cm<sup>2</sup>
!275mJ/cm<sup>2</sup>
!325mJ/cm<sup>2</sup>
!375mJ/cm<sup>2</sup>
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W15 MLA2 MiR F2 D225_04.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D275_03.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D325_03.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D375_03.jpg|280px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W15 MLA2 MiR F2 D225_01.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D275_02.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D325_01.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D375_01.jpg|280px]]
|}
<br clear="all" />
====Linewidth and sidewall angle vs defocus parameter (AZ MiR 701)====
<br clear="all" />
<br clear="all" />


Line 416: Line 497:
|- align="center"
|- align="center"
| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
|}
<br clear="all" />
'''SEM images of 1.5µm AZ MiR 701 as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 275mJ/cm<sup>2</sup>:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!Defoc -1
!Defoc 1
!Defoc 2
!Defoc 3
!Defoc 5
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W15 MLA2 MiR F-1 D275_01.jpg|280px]]
|[[Image:W15 MLA2 MiR F1 D275_01.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D275_03.jpg|280px]]
|[[Image:W15 MLA2 MiR F3 D275_01.jpg|280px]]
|[[Image:W15 MLA2 MiR F5 D275_01.jpg|280px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W15 MLA2 MiR F-1 D275_02.jpg|280px]]
|
|[[Image:W15 MLA2 MiR F2 D275_02.jpg|280px]]
|
|[[Image:W15 MLA2 MiR F5 D275_02.jpg|280px]]


|}
|}
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==AZ nLOF 2020==
==AZ nLOF 2020==
===Resolution===
<br clear="all" />
<br clear="all" />
 
===Resolution (AZ nLOF 2020)===
<br clear="all" />
'''Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:'''
'''Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:'''
{| class="wikitable"
{| class="wikitable"
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<br clear="all" />
<br clear="all" />


'''SEM images from different exposure equipment at optimal processing conditions for 2µm AZ nLOF 2020:'''
'''SEM images of 2µm AZ nLOF 2020 from different exposure equipment at optimal processing conditions:'''


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
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154mJ/cm<sup>2</sup>, vacuum contact
154mJ/cm<sup>2</sup>, vacuum contact
|[[Image:W07 MA6 nLOF D154 vac C8T_01.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_01.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_??.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_03.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_??.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_04.jpg|400px]]


|-
|-
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|Aligner: Maskless 01 (MLA1)
|Aligner: Maskless 01 (MLA1)
220mJ/cm<sup>2</sup>, Defoc -4
220mJ/cm<sup>2</sup>, Defoc -4
|[[Image:W06 MLA1 nLOF D220 F-4_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_??.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_03.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_??.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_04.jpg|400px]]


|-
|-
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450mJ/cm<sup>2</sup>, defoc 0
450mJ/cm<sup>2</sup>, defoc 0
|[[Image:W17 mla2 nLOF D450 F0_04.jpg|400px]]
|[[Image:W17 mla2 nLOF D450 F0_04.jpg|400px]]
|[[Image:W17 mla2 nLOF D450 F0_??.jpg|400px]]
|[[Image:W17 mla2 nLOF D450 F0_03.jpg|400px]]
|[[Image:W17 mla2 nLOF D450 F0_??.jpg|400px]]
|[[Image:W17 mla2 nLOF D450 F0_02.jpg|400px]]


|}
|}
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220mJ/cm<sup>2</sup>, Defoc -4
220mJ/cm<sup>2</sup>, Defoc -4
|[[Image:W06 MLA1 nLOF D220 F-4_02.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_02.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_03.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_03.jpg|400px]]


Line 525: Line 642:
<br clear="all" />
<br clear="all" />


'''Cross-sectional SEM images at optimal processing conditions for 2µm AZ nLOF 2020:'''
'''Cross-sectional SEM images of 2µm AZ nLOF 2020 at optimal processing conditions:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-
Line 542: Line 659:
|Aligner: Maskless 01 (MLA1)
|Aligner: Maskless 01 (MLA1)
220mJ/cm<sup>2</sup>, Defoc -4
220mJ/cm<sup>2</sup>, Defoc -4
|[[Image:w04_mla1_nLOF_D220_F-4_X_l_2um.jpg|280px]]
|[[Image:w04_mla1_nLOF_D220_F-4_X_l_2um.jpg|340px]]
|[[Image:w04_mla1_nLOF_D220_F-4_X_t_2um.jpg|280px]]
|[[Image:w04_mla1_nLOF_D220_F-4_X_t_2um.jpg|340px]]
|[[Image:w04_mla1_nLOF_D220_F-4_Xlines.jpg|280px]]
|[[Image:w04_mla1_nLOF_D220_F-4_Xlines.jpg|340px]]
|[[Image:w04_mla1_nLOF_D220_F-4_Xtrench.jpg|280px]]
|[[Image:w04_mla1_nLOF_D220_F-4_Xtrench.jpg|340px]]


|}
|}
<br clear="all" />
<br clear="all" />


===Resist profile (sidewall angle and linewidth)===
===Resist profile (AZ nLOF 2020)===
*SEM pictures to support graphs?
<br clear="all" />
 
====Linewidth and sidewall angle vs exposure dose (AZ nLOF 2020)====
<br clear="all" />
'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''


Line 568: Line 686:
<br clear="all" />
<br clear="all" />


'''SEM images of 2µm AZ nLOF 2020 as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!100mJ/cm<sup>2</sup>
!120mJ/cm<sup>2</sup>
!140mJ/cm<sup>2</sup>
!160mJ/cm<sup>2</sup>
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:w05_ma6_nLOF_D100_vac_2um.jpg|340px]]
|[[Image:w05_ma6_nLOF_D120_vac_2um.jpg|340px]]
|[[Image:w05_ma6_nLOF_D140_vac_2um.jpg|340px]]
|[[Image:w05_ma6_nLOF_D160_vac_2um.jpg|340px]]
|}
<br clear="all" />
'''SEM images of 2µm AZ nLOF 2020 as a function of exposure dose for Aligner: Maskless 01 (MLA1) using defoc -4:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!200mJ/cm<sup>2</sup>
!220mJ/cm<sup>2</sup>
!240mJ/cm<sup>2</sup>
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:w04_mla1_nLOF_D200_F-4_2um.jpg|340px]]
|[[Image:w04_mla1_nLOF_D220_F-4_2um.jpg|340px]]
|[[Image:w04_mla1_nLOF_D240_F-4_2um.jpg|340px]]
|}
<br clear="all" />
'''SEM images of 2µm AZ nLOF 2020 as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 0:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!400mJ/cm<sup>2</sup>
!450mJ/cm<sup>2</sup>
!500mJ/cm<sup>2</sup>
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W17 mla2 nLOF D400 F0_01.jpg|340px]]
|[[Image:W17 mla2 nLOF D450 F0_04.jpg|340px]]
|[[Image:W17 mla2 nLOF D500 F0_01.jpg|340px]]
|}
<br clear="all" />
====Linewidth and sidewall angle vs defocus parameter (AZ nLOF 2020)====
<br clear="all" />
'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''


Line 580: Line 771:
|- align="center"
|- align="center"
| colspan="2" | Linewidth and sidewall angle vs. defocus value  for 2µm AZ nLOF <br>exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm<sup>2</sup> and Aligner: Maskless 02 (MLA2) using dose 450mJ/cm<sup>2</sup>, respectively. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.
| colspan="2" | Linewidth and sidewall angle vs. defocus value  for 2µm AZ nLOF <br>exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm<sup>2</sup> and Aligner: Maskless 02 (MLA2) using dose 450mJ/cm<sup>2</sup>, respectively. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.
|}
<br clear="all" />
'''SEM images of 2µm AZ nLOF 2020 as a function of defocus parameter for Aligner: Maskless 01 (MLA1) using dose 220mJ/cm<sup>2</sup>:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!Defoc -14
!Defoc -7
!Defoc -4
!Defoc -1
!Defoc -6
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W06 MLA1 nLOF D220 F-14_02.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-7_01.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_01.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-1_01.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F6_02.jpg|280px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W06 MLA1 nLOF D220 F-14_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-7_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-1_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F6_03.jpg|280px]]
|}
<br clear="all" />
'''SEM images of 2µm AZ nLOF 2020 as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 450mJ/cm<sup>2</sup>:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!Defoc 0
!Defoc 2
!Defoc 4
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W17 mla2 nLOF D450 F0_04.jpg|340px]]
|[[Image:W17 mla2 nLOF D450 F2_01.jpg|340px]]
|[[Image:W17 mla2 nLOF D450 F4_02.jpg|340px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W17 mla2 nLOF D450 F0_03.jpg|340px]]
|[[Image:W17 mla2 nLOF D450 F2_02.jpg|340px]]
|[[Image:W17 mla2 nLOF D450 F4_03.jpg|340px]]
|}
|}
<br clear="all" />
<br clear="all" />

Latest revision as of 14:51, 18 June 2026

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

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Mask Aligner vs Maskless Aligner

In the first half of 2026, a rather thorough investigation of the differences between exposure using mask aligner and maskless aligner was conducted. The result was presented as an advanced lithography tutorial at the 2026 Nordic Nanolab User Meeting in Uppsala, Sweden.

Slides presented at NNUM in Uppsala: MA6 vs MLA 2026_v09

Mask design used in the investigation: LithoTestAlign_2025_v10.gds

Data from the investigation


AZ 5214E


Resolution (AZ 5214E)


Resolution at optimal processing conditions for 1.5µm AZ 5214E using different exposure equipment:

Exposure equipment Dose [mJ/cm2] Contact/Defoc Resolution [µm] Comment
Aligner: MA6-2 100 Vacuum 1
Aligner: MA6-1 100 Vacuum 1.25 Probably over-exposed
Aligner: Maskless 02 (MLA2) 90 2 1.25


SEM images from different exposure equipment for 1.5µm AZ 5214E at optimal processing conditions:

2µm triplets Lines Trenches
Aligner: MA6-2

100mJ/cm2, vacuum contact

Aligner: MA6-1

100mJ/cm2, vacuum contact
(probably over-exposed)

Aligner: Maskless 02 (MLA2)

90mJ/cm2, defoc 2


SEM images of different size structures for 1.5µm AZ 5214E:

1µm triplets 2µm triplets 4µm triplets
Aligner: MA6-1

100mJ/cm2, vacuum contact
(probably over-exposed)


Yield (AZ 5214E)

The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.

Wafer maps for 1.5µm AZ 5214E at optimal processing conditions for different aligners
Aligner: Maskless 02 (MLA2) (Dose 90mJ/cm2; defoc 2).
Resolution: 1.22µm average; 0.1µm standard deviation.
Yield at 1.25µm: 99%		 Aligner: MA6-2 (Dose 100mJ/cm2; vacuum contact).
Resolution: 1.02µm average; 0.1µm standard deviation.
Yield at 1.25µm: 100%		 Aligner: MA6-1 (Dose 100mJ/cm2; vacuum contact). Probably over-exposed.
Resolution: 1.30µm average; 0.2µm standard deviation.
Yield at 1.25µm: 59%


Effect of exposure mode for mask aligner

Wafer maps for 1.5µm AZ 5214E at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm2)
Hard contact.
Resolution: 1.17µm average; 0.2µm standard deviation.
Yield at 1.25µm: 89%		 Soft contact.
Resolution: 3.77µm average; 0.7µm standard deviation.
Yield at 2.5µm: 4%		 10µm proximity.
Resolution: 4.19µm average; 0.7µm standard deviation.
Yield at 2.5µm: 3%


Wafer maps for 1.5µm AZ 5214E at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm2, probably over-exposed)
Hard contact.
Resolution: 1.58µm average; 0.5µm standard deviation.
Yield at 1.25µm: 48%		 Soft contact.
Resolution: 2.36µm average; 0.4µm standard deviation.
Yield at 2.5µm: 80%
At dose 92mJ/cm2, the average resolution decreases to 1.91µm and the yield at 2.5µm increases to 100%		 10µm proximity.
Resolution: 2.73µm average; 0.6µm standard deviation.
Yield at 2.5µm: 53%


Effect of WEC pressure for mask aligner (after WEC head service)

Wafer maps for 1.5µm AZ 5214E at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm2)
Soft contact, 0.15bar WEC pressure.
Resolution: 3.92µm average; 0.9µm standard deviation.
Yield at 2.5µm: 8%		 Soft contact, 0.40bar WEC pressure.
Resolution: 2.19µm average; 0.5µm standard deviation.
Yield at 2.5µm: 86%
10µm proximity, 0.15bar WEC pressure.
Resolution: 3.22µm average; 0.8µm standard deviation.
Yield at 2.5µm: 34%		 10µm proximity, 0.40bar WEC pressure.
Resolution: 2.83µm average; 0.6µm standard deviation.
Yield at 2.5µm: 66%


Resist profile (AZ 5214E)


Linewidth and sidewall angle vs exposure dose (AZ 5214E)


Result of image analysis of SEM images of 2µm triplets:

Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).



SEM images of 1.5µm AZ 5214E as a function of exposure dose for Aligner: MA6-2 using vacuum contact:

85mJ/cm2 90mJ/cm2 95mJ/cm2 100mJ/cm2 105mJ/cm2
2µm triplets
Lines


SEM images of 1.5µm AZ 5214E as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:

80mJ/cm2 90mJ/cm2 100mJ/cm2 110mJ/cm2
2µm triplets
Trenches
and Lines


Linewidth and sidewall angle vs defocus parameter (AZ 5214E)


Result of image analysis of SEM images of 2µm triplets:

Linewidth and sidewall angle vs. defocus value for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm2.
Blue circles: Width of 2µm line.
Orange Squares: Sidewall angle.



SEM images of 1.5µm AZ 5214E as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm2:

Defoc -8 Defoc -1 Defoc 2 Defoc 5 Defoc 12
2µm triplets
Lines


AZ MiR 701


Resolution (AZ MiR 701)


Resolution at optimal processing conditions for 1.5µm AZ MiR 701 using different exposure equipment:

Exposure equipment Dose [mJ/cm2] Contact/Defoc Resolution [µm] Comment
Aligner: MA6-2 220 Vacuum 1
Aligner: Maskless 02 (MLA2) 275 2 1


SEM images of 1.5µm AZ MiR 701 from different exposure equipment at optimal processing conditions:

2µm triplets Lines Trenches
Aligner: MA6-2

220mJ/cm2, vacuum contact

Aligner: Maskless 02 (MLA2)

275mJ/cm2, defoc 2


Resist profile (AZ MiR 701)


Linewidth and sidewall angle vs exposure dose (AZ MiR 701)


Result of image analysis of SEM images of 2µm triplets:

Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ MiR 701.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).



SEM images of 1.5µm AZ MiR 701 as a function of exposure dose for Aligner: MA6-2 using vacuum contact:

160mJ/cm2 190mJ/cm2 220mJ/cm2 250mJ/cm2 280mJ/cm2
2µm triplets
Lines


SEM images of 1.5µm AZ MiR 701 as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:

225mJ/cm2 275mJ/cm2 325mJ/cm2 375mJ/cm2
2µm triplets
Lines


Linewidth and sidewall angle vs defocus parameter (AZ MiR 701)


Result of image analysis of SEM images of 2µm triplets:

Linewidth and sidewall angle vs. defocus value for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm2.
Blue circles: Width of 2µm line.
Orange Squares: Sidewall angle.



SEM images of 1.5µm AZ MiR 701 as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 275mJ/cm2:

Defoc -1 Defoc 1 Defoc 2 Defoc 3 Defoc 5
2µm triplets
Lines


AZ nLOF 2020


Resolution (AZ nLOF 2020)


Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:

Exposure equipment Dose [mJ/cm2] Contact/Defoc Resolution [µm] Comment
Aligner: MA6-2 154 Vacuum 1
Aligner: Maskless 01 (MLA1) 220 -4 2
Aligner: Maskless 02 (MLA2) 450 0 1.25


SEM images of 2µm AZ nLOF 2020 from different exposure equipment at optimal processing conditions:

2µm triplets Lines Trenches
Aligner: MA6-2

154mJ/cm2, vacuum contact

Aligner: Maskless 01 (MLA1)

220mJ/cm2, Defoc -4

Aligner: Maskless 02 (MLA2)

450mJ/cm2, defoc 0


SEM images of different size structures for 2µm AZ nLOF 2020:

1µm triplets 2µm triplets 4µm triplets
Aligner: MA6-2

154mJ/cm2, vacuum contact

Aligner: Maskless 01 (MLA1)

220mJ/cm2, Defoc -4


Cross-sectional SEM images of 2µm AZ nLOF 2020 at optimal processing conditions:

2µm lines 2µm trenches Lines Trenches
Aligner: Maskless 01 (MLA1)

220mJ/cm2, Defoc -4


Resist profile (AZ nLOF 2020)


Linewidth and sidewall angle vs exposure dose (AZ nLOF 2020)


Result of image analysis of SEM images of 2µm triplets:

Sidewall angle vs. exposure dose for 2µm AZ nLOF 2020.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2).
Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).



SEM images of 2µm AZ nLOF 2020 as a function of exposure dose for Aligner: MA6-2 using vacuum contact:

100mJ/cm2 120mJ/cm2 140mJ/cm2 160mJ/cm2
2µm triplets



SEM images of 2µm AZ nLOF 2020 as a function of exposure dose for Aligner: Maskless 01 (MLA1) using defoc -4:

200mJ/cm2 220mJ/cm2 240mJ/cm2
2µm triplets



SEM images of 2µm AZ nLOF 2020 as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 0:

400mJ/cm2 450mJ/cm2 500mJ/cm2
2µm triplets


Linewidth and sidewall angle vs defocus parameter (AZ nLOF 2020)


Result of image analysis of SEM images of 2µm triplets:

Linewidth and sidewall angle vs. defocus value for 2µm AZ nLOF
exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm2 and Aligner: Maskless 02 (MLA2) using dose 450mJ/cm2, respectively.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.



SEM images of 2µm AZ nLOF 2020 as a function of defocus parameter for Aligner: Maskless 01 (MLA1) using dose 220mJ/cm2:

Defoc -14 Defoc -7 Defoc -4 Defoc -1 Defoc -6
2µm triplets
Lines



SEM images of 2µm AZ nLOF 2020 as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 450mJ/cm2:

Defoc 0 Defoc 2 Defoc 4
2µm triplets
Lines


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