Latest revision as of 15:55, 11 June 2026

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

Feedback to this page: click here

Mask Aligner vs Maskless Aligner

Slides presented at NNUM in Uppsala 2026: MA6 vs MLA 2026_v09

Mask design used in the investigation: LithoTestAlign_2025_v10.gds

Additional data

THIS PAGE IS UNDER CONSTRUCTION

AZ 5214E

Resolution

Table with optimal parameters and resolution for different aligners
SEM pictures

Yield

The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.

**Wafer maps at optimal processing conditions for different aligners**


Aligner: Maskless 02 (MLA2) (Dose 90mJ/cm²; defoc 2). Resolution: 1.22µm average; 0.1µm standard deviation. Yield at 1.25µm: 99%	Aligner: MA6-2 (Dose 100mJ/cm²; vacuum contact). Resolution: 1.02µm average; 0.1µm standard deviation. Yield at 1.25µm: 100%	Aligner: MA6-1 (Dose 100mJ/cm²; vacuum contact). Probably over-exposed. Resolution: 1.30µm average; 0.2µm standard deviation. Yield at 1.25µm: 59%

Effect of exposure mode for mask aligner:

**Wafer maps at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm²)**


Hard contact. Resolution: 1.17µm average; 0.2µm standard deviation. Yield at 1.25µm: 89%	Soft contact. Resolution: 3.77µm average; 0.7µm standard deviation. Yield at 2.5µm: 4%	10µm proximity. Resolution: 4.19µm average; 0.7µm standard deviation. Yield at 2.5µm: 3%

**Wafer maps at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm², probably over-exposed)**


Hard contact. Resolution: 1.58µm average; 0.5µm standard deviation. Yield at 1.25µm: 48%	Soft contact. Resolution: 2.36µm average; 0.4µm standard deviation. Yield at 2.5µm: 80% At dose 92mJ/cm², the average resolution decreases to 1.91µm and the yield at 2.5µm increases to 100%	10µm proximity. Resolution: 2.73µm average; 0.6µm standard deviation. Yield at 2.5µm: 53%

Effect of WEC pressure for mask aligner (after WEC head service):

**Wafer maps at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm²)**


Soft contact, 0.15bar WEC pressure. Resolution: 3.92µm average; 0.9µm standard deviation. Yield at 2.5µm: 8%	Soft contact, 0.40bar WEC pressure. Resolution: 2.19µm average; 0.5µm standard deviation. Yield at 2.5µm: 86%

10µm proximity, 0.15bar WEC pressure. Resolution: 3.22µm average; 0.8µm standard deviation. Yield at 2.5µm: 34%	10µm proximity, 0.40bar WEC pressure. Resolution: 2.83µm average; 0.6µm standard deviation. Yield at 2.5µm: 66%

Resist profile (sidewall angle and linewidth)

SEM pictures to support graphs?

AZ MiR 701

Resolution

Table with optimal parameters and resolution for different aligners
SEM pictures

Resist profile (sidewall angle and linewidth)

SEM pictures to support graphs?

AZ nLOF 2020

Resolution

Table with optimal parameters and resolution for different aligners
SEM pictures

Resist profile (sidewall angle and linewidth)

SEM pictures to support graphs?

@@ Line 1: / Line 1: @@
-<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]
 {{cc-nanolab}}
@@ Line 10: / Line 8: @@
 __TOC__
-=Slides presented at NNUM 2026 in Uppsala=
+=Mask Aligner vs Maskless Aligner=
+Slides presented at NNUM in Uppsala 2026: [[media:MA6 vs MLA 2026_v09.pdf|'''MA6 vs MLA 2026_v09''']]
+Mask design used in the investigation: [[media:LithoTestAlign_2025_v10.gds|LithoTestAlign_2025_v10.gds]]
 =Additional data=
+<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]
+==AZ 5214E==
+===Resolution===
+* Table with optimal parameters and resolution for different aligners
+* SEM pictures
+<br clear="all" />
+===Yield===
+The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.
+<br clear="all" />
+{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
+! width="460" |
+! width="460" |
+! width="460" |
+|+'''Wafer maps at optimal processing conditions for different aligners'''
+|- border="0" align="center"
+|[[Image:Map_MLA2_D90_F2.jpg|450px]]
+|[[Image:Map_MA6-2_vacuum.jpg|450px]]
+|[[Image:Map_MA6-1_vacuum.jpg|450px]]
+|- align="center"
+| Aligner: Maskless 02 (MLA2) (Dose 90mJ/cm<sup>2</sup>; defoc 2). <br/>Resolution: 1.22µm average; 0.1µm standard deviation. <br/>Yield at 1.25µm: 99% ||  Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>; vacuum contact). <br/>Resolution: 1.02µm average; 0.1µm standard deviation. <br/>Yield at 1.25µm: 100% || Aligner: MA6-1 (Dose 100mJ/cm<sup>2</sup>; vacuum contact). Probably over-exposed. <br/>Resolution: 1.30µm average; 0.2µm standard deviation. <br/>Yield at 1.25µm: 59%
+|}
+<br clear="all" />
+'''Effect of exposure mode for mask aligner:'''
+{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
+! width="460" |
+! width="460" |
+! width="460" |
+|+'''Wafer maps at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
+|- border="0" align="center"
+|[[Image:Map_MA6-2_hard.jpg|450px]]
+|[[Image:Map_MA6-2_soft_clean.jpg|450px]]
+|[[Image:Map_MA6-2_prox.jpg|450px]]
+|- align="center"
+| Hard contact. <br/>Resolution: 1.17µm average; 0.2µm standard deviation. <br/>Yield at 1.25µm: 89% || Soft contact. <br/>Resolution: 3.77µm average; 0.7µm standard deviation. <br/>Yield at 2.5µm: 4% || 10µm proximity. <br/>Resolution: 4.19µm average; 0.7µm standard deviation. <br/>Yield at 2.5µm: 3%
+|}
+<br clear="all" />
+{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
+! width="460" |
+! width="460" |
+! width="460" |
+|+'''Wafer maps at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm<sup>2</sup>, probably over-exposed)'''
+|- border="0" align="center"
+|[[Image:Map_MA6-1_hard.jpg|450px]]
+|[[Image:Map_MA6-1_soft.jpg|450px]]
+|[[Image:Map_MA6-1_prox.jpg|450px]]
+|- align="center"
+| Hard contact. <br/>Resolution: 1.58µm average; 0.5µm standard deviation. <br/>Yield at 1.25µm: 48% || Soft contact. <br/>Resolution: 2.36µm average; 0.4µm standard deviation. <br/>Yield at 2.5µm: 80% <br/>At dose 92mJ/cm<sup>2</sup>, the average resolution decreases to 1.91µm and the yield at 2.5µm increases to 100% || 10µm proximity. <br/>Resolution: 2.73µm average; 0.6µm standard deviation. <br/>Yield at 2.5µm: 53%
+|}
+<br clear="all" />
+'''Effect of WEC pressure for mask aligner (after WEC head service):'''
+{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
+! width="460" |
+! width="460" |
+|+'''Wafer maps at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
+|- border="0" align="center"
+|[[Image:Map_MA6-2_soft_WEC015.jpg|450px]]
+|[[Image:Map_MA6-2_soft_WEC040.jpg|450px]]
+|- align="center"
+| Soft contact, 0.15bar WEC pressure. <br/>Resolution: 3.92µm average; 0.9µm standard deviation. <br/>Yield at 2.5µm: 8% || Soft contact, 0.40bar WEC pressure. <br/>Resolution: 2.19µm average; 0.5µm standard deviation. <br/>Yield at 2.5µm: 86%
+|- border="0" align="center"
+|[[Image:Map_MA6-2_prox_WEC015.jpg|450px]]
+|[[Image:Map_MA6-2_prox_WEC040.jpg|450px]]
+|- align="center"
+| 10µm proximity, 0.15bar WEC pressure. <br/>Resolution: 3.22µm average; 0.8µm standard deviation. <br/>Yield at 2.5µm: 34% || 10µm proximity, 0.40bar WEC pressure. <br/>Resolution: 2.83µm average; 0.6µm standard deviation. <br/>Yield at 2.5µm: 66%
+|}
+<br clear="all" />
+===Resist profile (sidewall angle and linewidth)===
+*SEM pictures to support graphs?
+[[Image:5214E_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
+[[Image:5214E_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
+[[Image:5214E_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]
+<!--
+{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
+! width="350" |
+! width="350" |
+|+'''Lithographic result vs. exposure dose. Data by Thomas Anhøj @ DTU Nanolab, 2026.'''
+|- border="0" align="center"
+|[[Image:5214E_Linewidth vs dose.jpg|450px]]
+|[[Image:5214E_Sidewall vs dose.jpg|450px]]
+|- align="center"
+| Width of 2µm line vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). || Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
+|}
+-->
+<br clear="all" />
+==AZ MiR 701==
+===Resolution===
+* Table with optimal parameters and resolution for different aligners
+* SEM pictures
+===Resist profile (sidewall angle and linewidth)===
+*SEM pictures to support graphs?
+[[Image:MiR_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
+[[Image:MiR_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
+[[Image:MiR_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 275mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]
+<br clear="all" />
+==AZ nLOF 2020==
+===Resolution===
+* Table with optimal parameters and resolution for different aligners
+* SEM pictures
+===Resist profile (sidewall angle and linewidth)===
+*SEM pictures to support graphs?
+[[Image:nLOF_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 2µm AZ nLOF 2020. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2). <br>Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).]]
+[[Image:nLOF_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose for 2µm AZ nLOF 2020. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2). <br>Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).]]
+[[Image:nLOF_MLA1_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value  for 2µm AZ nLOF exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]
+[[Image:nLOF_MLA2_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value  for 2µm AZ nLOF exposed in Aligner: Maskless 02 (MLA2) using dose 450mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]
+<br clear="all" />