Specific Process Knowledge/Characterization/SEM Supra 2: Difference between revisions
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''This page is written by DTU Nanolab internal'' | ''This page is written by DTU Nanolab internal'' | ||
[[image:SEM_Supra_2.jpg| | [[image:SEM_Supra_2.jpg|500x500px|right|thumb|The SEM Supra 2 is located in cleanroom C-1. {{photo1}} ]] | ||
=SEM Supra 2= | =SEM Supra 2= | ||
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The SEM Supra 2 is a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation. | The SEM Supra 2 is a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation. | ||
The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the | The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the SE2 and InLens detectors will no longer work, and a dedicated VPSE detector have to be used instead. | ||
This SEM has large chamber volume compared to the other SEM's in the cleanroom at DTU Nanolab. An 8" wafer can be loaded in the chamber, however the X and Y ranges only provide full view of a 6" wafer. | This SEM has large chamber volume compared to the other SEM's in the cleanroom at DTU Nanolab. An 8" wafer can be loaded in the chamber, however the X and Y ranges only provide full view of a 6" wafer. | ||
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All samples must be introduced into the chamber using an airlock. The airlock greatly reduces sample exchange times, and it accepts up to 8" wafer holders. | All samples must be introduced into the chamber using an airlock. The airlock greatly reduces sample exchange times, and it accepts up to 8" wafer holders. | ||
The SEM is equipped with an Oxford Instruments | The SEM is equipped with an Oxford Instruments Aztec Advanced Ultim 65 mm2 SDD EDX detector and Aztec software. EDX (Energy dispersive X-ray) detection is used for element composition analysis in a small area. A specific training is needed for users that want to use the EDX detector. | ||
The SEM | The SEM Supra 2 in located in the cleanroom. It was installed in December 2013. | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*1-2 nm (limited by vibrations) | *1-2 nm (limited by vibrations) | ||
The resolution is strongly dependent on the type | The resolution is strongly dependent on the SEM settings, the sample type and the skills of the operator | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics | !style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics | ||
|style="background:LightGrey; color:black"|Detectors | |style="background:LightGrey; color:black"|Detectors | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Secondary electron ( | *Secondary electron (SE2) | ||
*Inlens secondary electron (Inlens) | *Inlens secondary electron (Inlens) | ||
*Variable pressure secondary electron (VPSE) | *Variable pressure secondary electron (VPSE) | ||
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|style="background:LightGrey; color:black"|Stage | |style="background:LightGrey; color:black"|Stage | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*X, Y: 150 × 150 mm | *X, Y: 150 mm × 150 mm | ||
*T: -10 to 70<sup>o</sup> | *T: -10 to 70<sup>o</sup> | ||
*R: 360<sup>o</sup> | *R: 360<sup>o</sup> | ||
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|style="background:LightGrey; color:black"|Operating pressures | |style="background:LightGrey; color:black"|Operating pressures | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | *Fixed at High vacuum (2 × 10<sup>-4</sup >mbar - 10<sup>-6</sup> mbar) | ||
*Variable at Low vacuum (0.1 mbar - 2 mbar) | *Variable at Low vacuum (0.1 mbar - 2 mbar) | ||
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*Antivibration platform | *Antivibration platform | ||
*Fjeld M-200 airlock taking up to 8" wafers | *Fjeld M-200 airlock taking up to 8" wafers | ||
*Oxford Instruments | *Oxford Instruments Aztec Advanced Ultim 65 mm<sup>2</sup> SDD EDX detector and Aztec software package | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
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==Quality control of length | ==Quality control of length measurements == | ||
{| border="1" cellspacing="2" cellpadding="2" colspan="3" | {| border="1" cellspacing="2" cellpadding="2" colspan="3" | ||
|bgcolor="#98FB98" |'''Quality Control (QC) for SEM Supra 2''' | |bgcolor="#98FB98" |'''Quality Control (QC) for SEM Supra 2''' | ||