Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
| (3 intermediate revisions by 2 users not shown) | |||
| Line 54: | Line 54: | ||
# Development: Choose which equipment you wish to use to develop your photoresist from <u>[[Specific_Process_Knowledge/Lithography/Development|this list]]</u>. Remember the development process influences the <u>[[Specific_Process_Knowledge/Lithography/Resist#UV_Resist|exposure dose]]</u> | # Development: Choose which equipment you wish to use to develop your photoresist from <u>[[Specific_Process_Knowledge/Lithography/Development|this list]]</u>. Remember the development process influences the <u>[[Specific_Process_Knowledge/Lithography/Resist#UV_Resist|exposure dose]]</u> | ||
# Specify whether you wish to strip or lift-off your resist: <u>[[Specific_Process_Knowledge/Lithography/Strip|strip]]</u> and <u>[[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]</u> | # Specify whether you wish to strip or lift-off your resist: <u>[[Specific_Process_Knowledge/Lithography/Strip|strip]]</u> and <u>[[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]</u> | ||
==Mask Aligner versus Maskless Aligner== | |||
[[Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA|Mask Aligner vs Maskless Aligner]] | |||
<br clear=all /> | <br clear=all /> | ||
| Line 72: | Line 77: | ||
---> | ---> | ||
= | =Process information from our suppliers= | ||
MicroChemicals GmbH has a [https://www.microchemicals.com/downloads/application_notes.html very large online library] of information about UV lithography. | MicroChemicals GmbH has a [https://www.microchemicals.com/downloads/application_notes.html very large online library] of information about UV lithography. | ||
Of particular | Of particular interest is the [https://www.microchemicals.com/dokumente/application_notes/lithography_trouble_shooting.pdf lithography trouble-shooter] | ||