Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions
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=Developer: TMAH Manual 02= | =Developer: TMAH Manual 02= | ||
[[file:Developer_TMAH_manual_02.jpg|400px|right|thumb|Developer: TMAH Manual 02 is located in E-4.]] | [[file:Developer_TMAH_manual_02.jpg|400px|right|thumb|Developer: TMAH Manual 02 is located in E-4.]] | ||
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! scope=row style="text-align: left;" | Substrate batch size | ! scope=row style="text-align: left;" | Substrate batch size | ||
| 1 | | 1 | ||
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! scope=row style="text-align: left;" | Media flow rates | |||
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*AZ 726 MIF (TMAH): 300 ml/min | |||
*Process DI water: 400 ml/min | |||
*Backside rinse DI water: 140 ml/min | |||
*Process Nitrogen: 20 l/min | |||
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=Process information= | =Process information= | ||