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Specific Process Knowledge/Lithography/Strip/resistStrip: Difference between revisions

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=Resist Strip=
=Resist Strip=
[[Image:Resist_strip.jpg|400px|thumb|Resist strip bench in D-3]]
[[Image:Resist_strip.jpg|400px|thumb|Resist strip bench in D-3]]


This resist strip is only for wafers without metal and SU-8.
In the resist strip it is allowed to strip resist that is deposited on a metal layer. It is not allowed to strip resist with metal on top (lift off). Furthermore no SU-8 is allowed in the bath.


There are one Remover 1165 bath for stripping and one IPA bath for rinsing.
There are one Remover 1165 bath for stripping and one IPA bath for rinsing.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Strip/resistStrip"