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Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions

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{| class="wikitable"
{| class="wikitable"
! style="text-align:left" | Product:
! style="text-align:left" | Product
| style="padding-left: 10px" | Laurell EDC-650-HZB-23NP
| style="padding-left: 10px" | Laurell EDC-650-HZB-23NP
|-
|-
! style="text-align:left" | Year of purchase:   
! style="text-align:left" | Year of purchase  
| style="padding-left: 10px" | 2016
| style="padding-left: 10px" | 2016
|-
|-
! style="text-align:left" | Tool modification:
! style="text-align:left" | Tool modification
| style="padding-left: 10px" | Modified from e-beam solvent developer to UV TMAH developer in 2024
| style="padding-left: 10px" |  
Converted from e-beam solvent developer to UV TMAH developer in 2024<br>
Added media flow controllers for developer, rinse and drying media in 2025
|-
|-
! style="text-align:left" | Location:
! style="text-align:left" | Location
| style="padding-left: 10px" | Cleanroom E-4
| style="padding-left: 10px" | Cleanroom E-4
|}
|}


'''User manual'''<br>
'''User manual'''<br>
The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login'''
The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=341 LabManager] - '''requires login'''


'''Tool training'''<br>
'''Tool training'''<br>