Specific Process Knowledge/Lithography/UVExposure/aligner MA6-1: Difference between revisions
Created page with "==Aligner: MA6-1== 400px|thumb|The Aligner: MA6-1 is located in PolyFabLab. SUSS Mask Aligner MA6 is designed for high resolution photolithography. The 365nm exposure wavelength version is capable of 1.25 (1.0) um resolution in vacuum contact. All contact exposure programs (vacuum, hard, soft, proximity) are supplied. Two alignment options are available: top side alignment (TSA) with a split field or a video microscope and back side alig..." |
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=Aligner: MA6-1= | |||
[[Image:KSAligner in E-4.jpg|400px|thumb|The Aligner: MA6-1 is located in PolyFabLab.]] | [[Image:KSAligner in E-4.jpg|400px|thumb|The Aligner: MA6-1 is located in PolyFabLab.]] | ||
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The user manual(s), quality control procedure(s) and results, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=44 LabManager] - '''requires login''' | The user manual(s), quality control procedure(s) and results, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=44 LabManager] - '''requires login''' | ||
==Exposure dose== | |||
[[Specific Process Knowledge/Lithography/Resist#Aligner: | [[Specific Process Knowledge/Lithography/Resist/UVresist/exposureDoseMaskAligners#Aligner:_MA6-1|Information on UV exposure dose]] | ||
==Process information== | |||
The Aligner: MA6-1 has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm. | The Aligner: MA6-1 has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm. | ||
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==Quality Control (QC)== | |||
{| border="1" cellspacing="2" cellpadding="2" colspan="3" | {| border="1" cellspacing="2" cellpadding="2" colspan="3" | ||
|bgcolor="#98FB98" |'''Quality Control (QC) for KS Aligner''' | |bgcolor="#98FB98" |'''Quality Control (QC) for KS Aligner''' | ||
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==Equipment performance and process related parameters== | |||
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