Specific Process Knowledge/Pattern Design: Difference between revisions
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*Maskless aligner: | *Maskless aligner: | ||
**[[Media:MLA AlignmentMarks simple.gds|Simple alignment marks (.gds)]] | **[[Media:MLA AlignmentMarks simple.gds|Simple alignment marks (.gds)]] | ||
**[[Media: | **[[Media:MLA_alignmentMarks_arrows.cif|Alignment marks with structures to assist in locating the marks during alignment (.cif)]] | ||
**[[Media: | **[[Media:AlignmentMark_KOH.cif|Alignment mark for multiple layers, Layer 1 for etch in KOH (.cif)]] | ||
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*For Top Side Alignment (TSA) alignment marks should be located 35-80 mm in left and right in horizontal location (X) from mask center and between -20 and +20 mm in vertical location (Y) | *For Top Side Alignment (TSA) alignment marks should be located 35-80 mm in left and right in horizontal location (X) from mask center and between -20 and +20 mm in vertical location (Y) | ||
*For | *For Back Side Alignment (BSA) alignment marks should be located 15-45 mm in left and right in horizontal location (X) from mask center and between -20 and +20 mm in vertical location (Y) | ||
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