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Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Labspin|Spin Coater: LabSpin 02]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Labspin|Spin Coater: LabSpin 02]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Labspin|Spin Coater: LabSpin 03]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Labspin|Spin Coater: LabSpin 03]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_LabSpin_04|Spin Coater: LabSpin 04]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spray Coater|Spray Coater]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spray Coater|Spray Coater]]</b>
|-
|-
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**AZ5214E, AZ4562, AZMiR701, AZnLOF, SU-8
**AZ5214E, AZ4562, AZMiR701, AZnLOF, SU-8
*Coating of imprint resists
*Coating of imprint resists
|style="background:WhiteSmoke; color:black"|
*Coating of
**SU-8
**mr-DWL
**other resists
OBS: this tool is in PolyFabLab
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Spraying imprint resist
*Spraying imprint resist
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* Vacuum chucks for chips, 2", 4", and 6"
* Vacuum chucks for chips, 2", 4", and 6"
* 4" edge handling chuck
* 4" edge handling chuck
|style="background:WhiteSmoke; color:black"|
* Single substrate
* Vacuum chucks for chips, 4", and 6"
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Can handle almost any sample size and shape
Can handle almost any sample size and shape
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* KRF M230Y resist
* KRF M230Y resist
* KRF M35G resist
* KRF M35G resist
* PGMEA solvent for edge bead removal and backside rinse
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* AR-P 6200.09 (CSAR) for 2", 4", and 6"
* AR-P 6200.09 (CSAR) for 2", 4", and 6"
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No permanent media
No permanent media
|colspan="2" style="background:WhiteSmoke; color:black"|Only manual dispense
|colspan="2" style="background:WhiteSmoke; color:black"|Only manual dispense
|style="background:WhiteSmoke; color:black"|Only manual dispense
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
No permanent media
No permanent media
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* yes
* yes
* pneumatic dispense for SU-8 resist and EBR solvent
* pneumatic dispense for SU-8 resist and EBR solvent <span style="color:red">OBS: disabled 2024</span>
|colspan="2" style="background:WhiteSmoke; color:black"|Only manual dispense
|colspan="2" style="background:WhiteSmoke; color:black"|Only manual dispense
|style="background:WhiteSmoke; color:black"|Only manual dispense
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Two syringe pumps
Two syringe pumps
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10 - 5000 rpm (3000 rpm with non-vacuum chuck)
10 - 5000 rpm (3000 rpm with non-vacuum chuck)
|colspan="2" style="background:WhiteSmoke; color:black"|
|colspan="2" style="background:WhiteSmoke; color:black"|
100 - 5000 rpm (3000 rpm with edge handling chuck)
100 - 8000 rpm (3000 rpm with edge handling chuck)
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100 - 8000 rpm
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
|-
|-
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optional (max. speed 3000 rpm)
optional (max. speed 3000 rpm)
|colspan="2" style="background:WhiteSmoke; color:black"|
|colspan="2" style="background:WhiteSmoke; color:black"|
no
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no
no
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|style="background:WhiteSmoke; color:black"|
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*100 mm wafers
*100 mm wafers
*150 mm wafer
*150 mm wafer
*small pieces down to 10x10 mm2
*small pieces down to 5x5 mm2
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*100 mm wafers
*150 mm wafer
*small pieces down to 5x5 mm2
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|style="background:WhiteSmoke; color:black"|
Any sample(s) that fit inside machine
Any sample(s) that fit inside machine
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1
1
|colspan="2" style="background:WhiteSmoke; color:black"|
|colspan="2" style="background:WhiteSmoke; color:black"|
1
|style="background:WhiteSmoke; color:black"|
1
1
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
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*III-V materials
*III-V materials
*Glass
*Glass
|style="background:WhiteSmoke; color:black"|
All PolyFabLab materials
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*All chemicals to be spray coated must be approved specifically for spray coating
*All chemicals to be spray coated must be approved specifically for spray coating
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=Spin coaters at DTU Nanolab=
=Spin coaters at DTU Nanolab=
==Spin track==
<span style="color:red">The spin track was decommissioned 2018-02-01.</span>
[[Specific Process Knowledge/Lithography/Coaters/Spin_Track_1_%2B_2_processing|Information about decommissioned tool can be found here.]]


{{:Specific Process Knowledge/Lithography/Coaters/GammaUV}}
{{:Specific Process Knowledge/Lithography/Coaters/GammaUV}}
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{{:Specific Process Knowledge/Lithography/Coaters/labspin}}
{{:Specific Process Knowledge/Lithography/Coaters/labspin}}


=Spray Coater=
{{:Specific Process Knowledge/Lithography/Coaters/labspin04}}
[[image:1042_spraycoater_overview.jpg|400x239px|right|thumb|Spray Coater in Cleanroom C-1]]


The spray coater at DTU Nanolab is located in Cleanroom C-1. The machine is an ExactaCoat from Sono-tek which can be fitted with one of three different nozzles depending on the nature of the spray coating tasks at hand. The three different nozzles (Impact, AccuMist and Vortex) are optimized for different applications such as spray coating of large areas (e.g. entire wafers), smaller areas (e.g. wafer pieces or other small samples) or already structured samples that cannot be coated uniformly by spin coating. All nozzles use an ultrasonic tranducer for atomizing the solution to be spray coated. It is therefore a prerequisite that all components are compatible with this process. This is the case with most substances, although process parameters may need optimization to give satisfactory results.
{{:Specific Process Knowledge/Lithography/Coaters/sprayCoater}}


Practically any sample that will fit inside the spray coater can be processed. Spray patterns are easily programmed either using predefined spray patterns (1D line, 2D rectangles/circles/meanders/spirals) or custom 3D spray patterns.
=Decommisioned tools=
<span style="color:red">The spin track was decommissioned 2018-02-01.</span>


The spray coating process as well as major features of the three nozzles are described into more detail in the manual which can be found via the Equipment Info page in LabManager under the Documents sections. The manual can also be found in [http://labmanager.dtu.dk/d4Show.php?id=2523&mach=293 Labmanager] - '''requires login'''
[[Specific Process Knowledge/Lithography/Coaters/Spin_Track_1_%2B_2_processing|Information about decommissioned tool can be found here.]]
 
 
Further information about the spray coater (manual, process log, technical information etc.) can be found in LabManger:
 
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=293 Spray coater in LabManager] - '''requires login'''
 
 
== Process development==
'''Spray coating using TI spray:'''<br>
The TI spray resist is the standard spray coater resist used at DTU Nanolab. It requires no dilution and performs well.
 
 
''' Spray coating using other resists:'''<br>
Other resists are allowed, but most require dilution, as the spray coater will not work with any resist viscosity higher than 20 cP.
 
 
==Equipment performance and process related parameters==
 
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"
 
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
|style="background:WhiteSmoke; color:black"|<b>Spray Coater</b>
|-
!style="background:silver; color:black;" align="center"|Purpose
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
*Spraying imprint resists  (primarily mr-NIL 6000E and mr-I 8000E)
*Spraying photoresist (primarily AZ-4562)
*Spraying of other solutions
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance
|style="background:LightGrey; color:black"|Substrate handling
|style="background:WhiteSmoke; color:black"|
* Can handle almost any sample size and shape (although no automatic handling)
|-
|style="background:LightGrey; color:black"|Permanent media
|style="background:WhiteSmoke; color:black"|
* No permanent media
|-
|style="background:LightGrey; color:black"|Manual dispense option
|style="background:WhiteSmoke; color:black"|
* Two syringe pumps
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
|style="background:LightGrey; color:black"|Solution viscosity
|style="background:WhiteSmoke; color:black"|
*Should not exceed 20 cP
|-
|style="background:LightGrey; color:black"|Chemical properties
|style="background:WhiteSmoke; color:black"|
*Must be non-toxic
*Must be compatible with titanium
*Resistant to ultrasonic sonication
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
*Any sample(s) size and number that fit inside machine
|-
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black"|
*'''All chemicals to be spray coated must be approved specifically for spray coating'''
*Most non-toxic, non-particulate and non-crosslinking material likely to be approved
*Suspensions challenging due to very low diameter tubing
|-
|}
 
<br clear="all" />