Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Labspin|Spin Coater: LabSpin 02]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Labspin|Spin Coater: LabSpin 02]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Labspin|Spin Coater: LabSpin 03]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Labspin|Spin Coater: LabSpin 03]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_LabSpin_04|Spin Coater: LabSpin 04]]</b> | |||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spray Coater|Spray Coater]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spray Coater|Spray Coater]]</b> | ||
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**AZ5214E, AZ4562, AZMiR701, AZnLOF, SU-8 | **AZ5214E, AZ4562, AZMiR701, AZnLOF, SU-8 | ||
*Coating of imprint resists | *Coating of imprint resists | ||
|style="background:WhiteSmoke; color:black"| | |||
*Coating of | |||
**SU-8 | |||
**mr-DWL | |||
**other resists | |||
OBS: this tool is in PolyFabLab | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Spraying imprint resist | *Spraying imprint resist | ||
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* Vacuum chucks for chips, 2", 4", and 6" | * Vacuum chucks for chips, 2", 4", and 6" | ||
* 4" edge handling chuck | * 4" edge handling chuck | ||
|style="background:WhiteSmoke; color:black"| | |||
* Single substrate | |||
* Vacuum chucks for chips, 4", and 6" | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Can handle almost any sample size and shape | Can handle almost any sample size and shape | ||
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* KRF M230Y resist | * KRF M230Y resist | ||
* KRF M35G resist | * KRF M35G resist | ||
* PGMEA solvent for edge bead removal and backside rinse | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* AR-P 6200.09 (CSAR) for 2", 4", and 6" | * AR-P 6200.09 (CSAR) for 2", 4", and 6" | ||
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No permanent media | No permanent media | ||
|colspan="2" style="background:WhiteSmoke; color:black"|Only manual dispense | |colspan="2" style="background:WhiteSmoke; color:black"|Only manual dispense | ||
|style="background:WhiteSmoke; color:black"|Only manual dispense | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
No permanent media | No permanent media | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* yes | * yes | ||
* pneumatic dispense for SU-8 resist and EBR solvent | * pneumatic dispense for SU-8 resist and EBR solvent <span style="color:red">OBS: disabled 2024</span> | ||
|colspan="2" style="background:WhiteSmoke; color:black"|Only manual dispense | |colspan="2" style="background:WhiteSmoke; color:black"|Only manual dispense | ||
|style="background:WhiteSmoke; color:black"|Only manual dispense | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Two syringe pumps | Two syringe pumps | ||
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10 - 5000 rpm (3000 rpm with non-vacuum chuck) | 10 - 5000 rpm (3000 rpm with non-vacuum chuck) | ||
|colspan="2" style="background:WhiteSmoke; color:black"| | |colspan="2" style="background:WhiteSmoke; color:black"| | ||
100 - | 100 - 8000 rpm (3000 rpm with edge handling chuck) | ||
|style="background:WhiteSmoke; color:black"| | |||
100 - 8000 rpm | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
|- | |- | ||
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optional (max. speed 3000 rpm) | optional (max. speed 3000 rpm) | ||
|colspan="2" style="background:WhiteSmoke; color:black"| | |colspan="2" style="background:WhiteSmoke; color:black"| | ||
no | |||
|style="background:WhiteSmoke; color:black"| | |||
no | no | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
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*100 mm wafers | *100 mm wafers | ||
*150 mm wafer | *150 mm wafer | ||
*small pieces down to | *small pieces down to 5x5 mm2 | ||
|style="background:WhiteSmoke; color:black"| | |||
*100 mm wafers | |||
*150 mm wafer | |||
*small pieces down to 5x5 mm2 | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Any sample(s) that fit inside machine | Any sample(s) that fit inside machine | ||
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1 | 1 | ||
|colspan="2" style="background:WhiteSmoke; color:black"| | |colspan="2" style="background:WhiteSmoke; color:black"| | ||
1 | |||
|style="background:WhiteSmoke; color:black"| | |||
1 | 1 | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
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*III-V materials | *III-V materials | ||
*Glass | *Glass | ||
|style="background:WhiteSmoke; color:black"| | |||
All PolyFabLab materials | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*All chemicals to be spray coated must be approved specifically for spray coating | *All chemicals to be spray coated must be approved specifically for spray coating | ||
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=Spin coaters at DTU Nanolab= | =Spin coaters at DTU Nanolab= | ||
{{:Specific Process Knowledge/Lithography/Coaters/GammaUV}} | {{:Specific Process Knowledge/Lithography/Coaters/GammaUV}} | ||
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{{:Specific Process Knowledge/Lithography/Coaters/labspin}} | {{:Specific Process Knowledge/Lithography/Coaters/labspin}} | ||
{{:Specific Process Knowledge/Lithography/Coaters/labspin04}} | |||
{{:Specific Process Knowledge/Lithography/Coaters/sprayCoater}} | |||
=Decommisioned tools= | |||
<span style="color:red">The spin track was decommissioned 2018-02-01.</span> | |||
[[Specific Process Knowledge/Lithography/Coaters/Spin_Track_1_%2B_2_processing|Information about decommissioned tool can be found here.]] | |||