Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong: Difference between revisions
No edit summary |
No edit summary |
||
| (One intermediate revision by the same user not shown) | |||
| Line 2: | Line 2: | ||
<br> {{CC-bghe1}} <br> | <br> {{CC-bghe1}} <br> | ||
=With C4F8 and H2 chemistry (all tests done by Peixiong Shi, DTU Nanolab)= | =With C4F8 and H2 chemistry (all tests done by Peixiong Shi, DTU Nanolab)= | ||
APOX refers to a thick SiO2 grown on a silicon wafer in a wet thermal process at high temperature. | |||
==Part 1== | ==Part 1== | ||
{| class=MsoNormalTable border=0 cellspacing=0 cellpadding=0 width=855 style='width:641.0pt;border-collapse:collapse' style='height:36.0pt' | {| class=MsoNormalTable border=0 cellspacing=0 cellpadding=0 width=855 style='width:641.0pt;border-collapse:collapse' style='height:36.0pt' | ||